Logotipo do repositório
 

Publicação:
Low voltage electroluminescence of terbium- and thulium-doped zinc oxide films

Carregando...
Imagem de Miniatura

Orientador

Coorientador

Pós-graduação

Curso de graduação

Título da Revista

ISSN da Revista

Título de Volume

Editor

Elsevier B.V.

Tipo

Artigo

Direito de acesso

Acesso restrito

Resumo

Strong interest in developing technology for visual information. stimulates research for thin film electroluminescent devices. Here, for the first time, we report that thulium- and terbium-doped zinc-oxide films are suitable for electroluminescence applications. Two different devices were assembled as lTO/LiF/ZnO:RE/LiF/Al or ITO/SiO2/ZnO:RE/SiO2/Al, where ZnO:RE is a film of zinc oxide containing 10 at% of Tb3+ or Tm3+. Electroluminescence spectra show that besides a broad emission band with maximum around 650 nm assigned to ZnO, also emission lines from Tb3+ at 484 nm (D-5(4) -> F-7(6)), 543 nm (D-5(4) -> F-7(6)), and 589 nm (D-5(4) -> F-7(4)), or from Tm3+ at 478 nm ((1)G(4) -> H-3(6)), and 511 mn (D-1(2) -> H-3(5)) were detected. Intensity of emission as function of applied voltage and current-voltage characteristic are shown and discussed. (c) 2005 Elsevier B.V. All rights reserved.

Descrição

Palavras-chave

thin films, semiconductors, chemical synthesis, electronical transport, luminescence

Idioma

Inglês

Como citar

Journal of Alloys and Compounds. Lausanne: Elsevier B.V. Sa, v. 418, n. 1-2, p. 35-38, 2006.

Itens relacionados

Financiadores

Unidades

Departamentos

Cursos de graduação

Programas de pós-graduação