Optimum-Path Forest Classifier for Large Scale Biometric Applications
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2012-01-01
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IEEE Computer Soc
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This paper addresses biometric identification using large databases, in particular, iris databases. In such applications, it is critical to have low response time, while maintaining an acceptable recognition rate. Thus, the trade-off between speed and accuracy must be evaluated for processing and recognition parts of an identification system. In this paper, a graph-based framework for pattern recognition, called Optimum-Path Forest (OPF), is utilized as a classifier in a pre-developed iris recognition system. The aim of this paper is to verify the effectiveness of OPF in the field of iris recognition, and its performance for various scale iris databases. The existing Gauss-Laguerre Wavelet based coding scheme is used for iris encoding. The performance of the OPF and two other - Hamming and Bayesian - classifiers, is compared using small, medium, and large-scale databases. Such a comparison shows that the OPF has faster response for large-scale databases, thus performing better than the more accurate, but slower, classifiers.
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2012 Third International Conference on Emerging Security Technologies (est). Los Alamitos: IEEE Computer Soc, p. 58-61, 2012.