Adsorption of silanes bearing nitrogenated Lewis bases on SiO 2/Si (100) model surfaces
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The present paper describes the one-pot procedure for the formation of self-assembled thin films of two silanes on the model oxidized silicon wafer, SiO2/Si. SiO2/Si is a model system for other surfaces, such as glass, quartz, aerosol, and silica gel. MALDI-TOF MS with and without a matrix, XPS, and AFM have confirmed the formation of self-assembled thin films of both 3-imidazolylpropyltrimethoxysilane (3-IPTS) and 4-(N- propyltriethoxysilane-imino)pyridine (4-PTSIP) on the SiO2/Si surface after 30 min. Longer adsorption times lead to the deposition of nonreacted 3-IPTS precursors and the formation of agglomerates on the 3-IPTS monolayer. The formation of 4-PTSIP self-assembled layers on SiO2/Si is also demonstrated. The present results for the flat SiO2/Si surface can lead to a better understanding of the formation of a stationary phase for affinity chromatography as well as transition-metal-supported catalysts on silica and their relationship with surface roughness and ordering. The 3-IPTS and 4-PTSIP modified SiO2/Si wafers can also be envisaged as possible built-on-silicon thin-layer chromatography (TLC) extraction devices for metal determination or N-heterocycle analytes, such as histidine and histamine, with on-spot MALDI-TOF MS detection. © 2005 Elsevier Inc. All rights reserved.
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3-Imidazolylpropyltrimethoxysilane, 4-(N-Propyltriethoxysilane-imino) pyridine, AFM, MALDI-TOF MS, Self-assembled thin films, Silicon dioxide, Silicon wafer, XPS, Aerosols, Agglomeration, Glass, Mathematical models, Monolayers, Oxidation, Quartz, Self assembly, Silanes, Silica, Surface chemistry, Thin films, Thin layer chromatography, Model systems, Nitrogenated Lewis bases, Oxidized silicon wafers, Adsorption, heterocyclic compound, histamine, histidine, Lewis base, silane derivative, silicon dioxide, transition element, adsorption, affinity chromatography, atomic force microscopy, chemical model, chemical reaction, film, matrix assisted laser desorption ionization time of flight mass spectrometry, metal extraction, nitration, oxidation kinetics, phase transition, priority journal, reaction analysis, thin layer chromatography, X ray powder diffraction
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Journal of Colloid and Interface Science, v. 286, n. 1, p. 303-309, 2005.
