Infrared spectroscopy investigation of various plasma-deposited polymer films irradiated with 170 keV He+ ions

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dc.contributor.authorGelamo, R. V.
dc.contributor.authorTrasferetti, B. C.
dc.contributor.authorDurrant, S. F.
dc.contributor.authorDavanzo, C. U.
dc.contributor.authorRouxinol, F. P.
dc.contributor.authorGadioli, G. Z.
dc.contributor.authorBica de Moraes, M. A.
dc.contributor.institutionUniversidade Estadual de Campinas (UNICAMP)
dc.contributor.institutionUniversidade Estadual Paulista (Unesp)
dc.date.accessioned2014-05-20T15:25:54Z
dc.date.available2014-05-20T15:25:54Z
dc.date.issued2006-08-01
dc.description.abstractThis work illustrates the advantages of using p-polarized radiation at an incidence angle of 70 degrees in contrast to the conventional unpolarized beam at normal (or near-normal) incidence for the infrared spectroscopic study of polycarbosilane, polysilazane and polysiloxane thin films synthesized by plasma enhanced chemical vapor deposition (PECVD) and subsequently irradiated with 170 keV He+ ions at fluences from 1 x 10(14) to 1 x 10(16) cm(-2). Several bands not seen using the conventional mode could be observed in the polarized mode. (c) 2006 Elsevier B.V. All rights reserved.en
dc.description.affiliationUniv Estadual Campinas, Dept Fis Aplicada, Inst Fis Gleb Wataghin, BR-13083970 Campinas, SP, Brazil
dc.description.affiliationUniv Estadual Paulista, UNESP, Lab Plasmas Tecnol, BR-18087180 Sorocaba, SP, Brazil
dc.description.affiliationUniv Estadual Campinas, Inst Quim, UNICAMP, BR-13083970 Campinas, SP, Brazil
dc.description.affiliationUnespUniv Estadual Paulista, UNESP, Lab Plasmas Tecnol, BR-18087180 Sorocaba, SP, Brazil
dc.format.extent162-166
dc.identifierhttp://dx.doi.org/10.1016/j.nimb.2006.03.105
dc.identifier.citationNuclear Instruments & Methods In Physics Research Section B-beam Interactions With Materials and Atoms. Amsterdam: Elsevier B.V., v. 249, p. 162-166, 2006.
dc.identifier.doi10.1016/j.nimb.2006.03.105
dc.identifier.issn0168-583X
dc.identifier.orcid0000-0002-4511-3768
dc.identifier.urihttp://hdl.handle.net/11449/36217
dc.identifier.wosWOS:000239545000042
dc.language.isoeng
dc.publisherElsevier B.V.
dc.relation.ispartofNuclear Instruments & Methods In Physics Research Section B-beam Interactions With Materials and Atoms
dc.relation.ispartofjcr1.323
dc.rights.accessRightsAcesso restrito
dc.sourceWeb of Science
dc.subjection irradiationpt
dc.subjectSi-based polymer filmpt
dc.subjectplasma polymerizationpt
dc.subjectchemical structurept
dc.subjectFTIRpt
dc.titleInfrared spectroscopy investigation of various plasma-deposited polymer films irradiated with 170 keV He+ ionsen
dc.typeArtigo
dcterms.licensehttp://www.elsevier.com/about/open-access/open-access-policies/article-posting-policy
dcterms.rightsHolderElsevier B.V.
unesp.author.orcid0000-0002-4511-3768[3]

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