Fatigue and retention properties of Bi3.25La0.75Ti3O12 films using LaNiO3 bottom electrodes

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dc.contributor.authorSimões, Alexandre Zirpoli [UNESP]
dc.contributor.authorAguiar, E. C. [UNESP]
dc.contributor.authorRiccardi, C. S. [UNESP]
dc.contributor.authorLongo, Elson [UNESP]
dc.contributor.authorVarela, José Arana [UNESP]
dc.contributor.institutionUniversidade Estadual Paulista (Unesp)
dc.date.accessioned2014-05-20T15:32:20Z
dc.date.available2014-05-20T15:32:20Z
dc.date.issued2009-05-01
dc.description.abstractFatigue-free Bi3.25La0.75Ti3O12 (BLT) thin films were grown on LaNiO3 bottom electrodes grown in a microwave furnace at 700 degrees C for 10 min from the polymeric precursor method. It was found that LaNiO3 (LNO) bottom electrode with pseudocubic structure strongly promote the formation. of (001) texture of BLT films. The remanent polarization (P-r) and the drive voltage (V-c) were 11 mu C/cm(2) and 1.3 V respectively, and are better than the values found in the literature. The polarization of the Au/BLT/LNO/SiO2/Si (100) capacitors with a thickness of 280 nm exhibited no degradation after 1 x 1010 switching cycles at an applied voltage of 5 V with a frequency of 1 MHz. After several tests the capacitors retain 77% of its polarization upon a retention time of 10(4) s. (C) 2008 Elsevier B.V. All rights reserved.en
dc.description.affiliationUniv Estadual Paulista, Inst Chem, UNESP, BR-14800900 Araraquara, SP, Brazil
dc.description.affiliationUnespUniv Estadual Paulista, Inst Chem, UNESP, BR-14800900 Araraquara, SP, Brazil
dc.description.sponsorshipFundação de Amparo à Pesquisa do Estado de São Paulo (FAPESP)
dc.description.sponsorshipConselho Nacional de Desenvolvimento Científico e Tecnológico (CNPq)
dc.description.sponsorshipCoordenação de Aperfeiçoamento de Pessoal de Nível Superior (CAPES)
dc.format.extent353-356
dc.identifierhttp://dx.doi.org/10.1016/j.matchar.2008.09.015
dc.identifier.citationMaterials Characterization. New York: Elsevier B.V., v. 60, n. 5, p. 353-356, 2009.
dc.identifier.doi10.1016/j.matchar.2008.09.015
dc.identifier.issn1044-5803
dc.identifier.lattes3573363486614904
dc.identifier.urihttp://hdl.handle.net/11449/41273
dc.identifier.wosWOS:000265153800001
dc.language.isoeng
dc.publisherElsevier B.V.
dc.relation.ispartofMaterials Characterization
dc.relation.ispartofjcr2.892
dc.relation.ispartofsjr1,291
dc.rights.accessRightsAcesso restrito
dc.sourceWeb of Science
dc.subjectThin filmsen
dc.subjectMicrowave furnaceen
dc.subjectBottom electrodeen
dc.subjectCapacitoren
dc.subjectRetentionen
dc.titleFatigue and retention properties of Bi3.25La0.75Ti3O12 films using LaNiO3 bottom electrodesen
dc.typeArtigo
dcterms.licensehttp://www.elsevier.com/about/open-access/open-access-policies/article-posting-policy
dcterms.rightsHolderElsevier B.V.
unesp.author.lattes3573363486614904
unesp.author.lattes0173401604473200[3]
unesp.author.orcid0000-0003-2192-5312[3]
unesp.campusUniversidade Estadual Paulista (Unesp), Instituto de Química, Araraquarapt
unesp.campusUniversidade Estadual Paulista (Unesp), Faculdade de Engenharia, Guaratinguetápt

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