Mechanical and tribological properties of a-C:H:F Thin Films

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dc.contributor.authorSantos, N. M. [UNESP]
dc.contributor.authorMota, Rogério Pinto [UNESP]
dc.contributor.authorHonda, R. Y. [UNESP]
dc.contributor.authorAlgatti, M. A. [UNESP]
dc.contributor.authorKostov, K. G. [UNESP]
dc.contributor.authorKayama, M. E. [UNESP]
dc.contributor.authorNascente, P. A P
dc.contributor.authorCruz, N. C. [UNESP]
dc.contributor.authorRangel, E. C. [UNESP]
dc.contributor.institutionUniversidade Estadual Paulista (Unesp)
dc.contributor.institutionUniversidade Federal de São Carlos (UFSCar)
dc.date.accessioned2014-05-27T11:29:48Z
dc.date.available2014-05-27T11:29:48Z
dc.date.issued2013-07-01
dc.description.abstracta-C:H films were grown by plasma-enhanced chemical vapor deposition in atmospheres composed by 30 % of acetylene and 70 % of argon. Radiofrequency signal (RF) was supplied to the sample holder to generate the depositing plasmas. Deposition time and pressure were chosen 300 s and 9.5 Pa, respectively, while the excitation power changed from 5 to 125 W. The films were exposed to a post-deposition treatment during 300 s in RF-plasmas (13.56 MHz, 70 W) excited from 13.33 Pa of SF6. Raman and X-ray photoelectron spectroscopy were used to evaluate the microstructure and chemical composition of the films. The thickness was measured by perfilometry. Hardness and friction coefficient were determined from nanoindentation and risk tests, respectively. With increasing power, the film thickness reduced, but a further shrinkage occurred upon the fluorination process. After that, the molecular structure was observed to vary with deposition power. Fluorine was detected in all samples replacing H atoms. Consistently with the elevation in the proportion of C atoms with sp3 hybridization, hardness increased from 2 to 18 GPa. Friction coefficient also increased with power due to the generation of dangling bonds during the fluorination process. © 2012 Springer Science+Business Media, LLC.en
dc.description.affiliationUNESP, Guaratinguetá SP
dc.description.affiliationUNESP Campus Experimental de Sorocaba, Sorocaba SP
dc.description.affiliationDepartamento de Engenharia de Materiais UFSCar, São Carlos SP
dc.description.affiliationUnespUNESP, Guaratinguetá SP
dc.description.affiliationUnespUNESP Campus Experimental de Sorocaba, Sorocaba SP
dc.format.extent2525-2528
dc.identifierhttp://dx.doi.org/10.1007/s10948-012-1729-4
dc.identifier.citationJournal of Superconductivity and Novel Magnetism, v. 26, n. 7, p. 2525-2528, 2013.
dc.identifier.doi10.1007/s10948-012-1729-4
dc.identifier.issn1557-1939
dc.identifier.issn1557-1947
dc.identifier.scopus2-s2.0-84879112761
dc.identifier.urihttp://hdl.handle.net/11449/75746
dc.identifier.wosWOS:000323923800034
dc.language.isoeng
dc.relation.ispartofJournal of Superconductivity and Novel Magnetism
dc.relation.ispartofjcr1.142
dc.relation.ispartofsjr0,320
dc.relation.ispartofsjr0,320
dc.rights.accessRightsAcesso restrito
dc.sourceScopus
dc.subjectPECVD
dc.subjectSF6 treatment
dc.subjectSurface modification
dc.subjectChemical compositions
dc.subjectDeposition power
dc.subjectExcitation power
dc.subjectFriction coefficients
dc.subjectMechanical and tribological properties
dc.subjectPost deposition treatment
dc.subjectRadiofrequency signals
dc.subjectFluorination
dc.subjectFriction
dc.subjectHardness
dc.subjectPhotoelectrons
dc.subjectPlasma enhanced chemical vapor deposition
dc.subjectSulfur hexafluoride
dc.subjectSurface treatment
dc.subjectX ray photoelectron spectroscopy
dc.subjectDeposition
dc.titleMechanical and tribological properties of a-C:H:F Thin Filmsen
dc.typeArtigo
dcterms.licensehttp://www.springer.com/open+access/authors+rights
unesp.author.lattes7157327220048138
unesp.author.lattes6885205382275380
unesp.author.orcid0000-0002-0354-3890[8]
unesp.author.orcid0000-0002-9821-8088[5]
unesp.author.orcid0000-0003-3745-2425[6]
unesp.campusUniversidade Estadual Paulista (Unesp), Instituto de Ciência e Tecnologia, Sorocabapt

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