Diverse Amorphous Carbonaceous Thin Films Obtained by Plasma Enhanced Chemical Vapor Deposition and Plasma Immersion Ion Implantation and Deposition

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dc.contributor.authorSantos, R. M. [UNESP]
dc.contributor.authorTurri, R. [UNESP]
dc.contributor.authorRangel, E. C. [UNESP]
dc.contributor.authorda Cruz, N. C. [UNESP]
dc.contributor.authorSchreiner, W.
dc.contributor.authorDavanzo, C. U.
dc.contributor.authorDurrant, S. F. [UNESP]
dc.contributor.institutionUniversidade Estadual Paulista (Unesp)
dc.date.accessioned2014-05-20T15:34:51Z
dc.date.available2014-05-20T15:34:51Z
dc.date.issued2012-01-01
dc.description.abstractDiverse amorphous hydrogenated carbon and similar films containing additional elements were produced by Plasma Enhanced Chemical Vapor Deposition (PECVD) and by Plasma Immersion Ion Implantation and Deposition (PIIID). Thus a-C:H, a-C:H:F, a-C:H:N, a-C:H:Cl and a-C:H:O:Si were obtained, starting from the same feed gases, using both techniques. The same deposition system supplied with radiofrequency (RF) power was used to produce all the films. A cylindrical stainless steel chamber equipped with circular electrodes mounted horizontally was employed. RF power was fed to the upper electrode; substrates were placed on the lower electrode. For PIIID negative high tension pulses were also applied to the lower electrode. Raman spectroscopy confirmed that all the films are amorphous. Chemical characterization of each pair of films was undertaken using Infrared Reflection Absorption Spectroscopy and X-ray Photoelectron Spectroscopy. The former revealed the presence of specific structures, such as C-H, C-O, O-H. The latter allowed calculation of the ratio of hetero-atoms to carbon atoms in the films, e. g. F:C, N:C, and Si:C. Only relatively small differences in elemental composition were detected between films produced by the two methods. The deposition rate in PIIID is generally reduced in relation to that of PECVD; for a-C:H:Cl films the reduction factor is almost four.en
dc.description.affiliationUniv Estadual Paulista UNESP, Lab Plasmas Tecnol, BR-18087180 Sorocaba, SP, Brazil
dc.description.affiliationUnespUniv Estadual Paulista UNESP, Lab Plasmas Tecnol, BR-18087180 Sorocaba, SP, Brazil
dc.format.extent48-57
dc.identifierhttp://dx.doi.org/10.1016/j.phpro.2012.03.517
dc.identifier.citation18th International Vacuum Congress (ivc-18). Amsterdam: Elsevier B.V., v. 32, p. 48-57, 2012.
dc.identifier.doi10.1016/j.phpro.2012.03.517
dc.identifier.fileWOS000310677500006.pdf
dc.identifier.issn1875-3892
dc.identifier.orcid0000-0002-4511-3768
dc.identifier.urihttp://hdl.handle.net/11449/42667
dc.identifier.wosWOS:000310677500006
dc.language.isoeng
dc.publisherElsevier B.V.
dc.relation.ispartof18th International Vacuum Congress (ivc-18)
dc.rights.accessRightsAcesso aberto
dc.sourceWeb of Science
dc.subjectcarbonacous thin filmsen
dc.subjectXPSen
dc.subjectIRRASen
dc.subjectRaman spectroscopyen
dc.titleDiverse Amorphous Carbonaceous Thin Films Obtained by Plasma Enhanced Chemical Vapor Deposition and Plasma Immersion Ion Implantation and Depositionen
dc.typeTrabalho apresentado em evento
dcterms.licensehttp://www.elsevier.com/about/open-access/open-access-policies/article-posting-policy
dcterms.rightsHolderElsevier B.V.
unesp.author.lattes6885205382275380
unesp.author.lattes7157327220048138
unesp.author.lattes5137862536106636
unesp.campusUniversidade Estadual Paulista (Unesp), Instituto de Ciência e Tecnologia, Sorocabapt

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