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Publicação:
Multilayered TiO2/TiO2−x/TiO2 films deposited by reactive sputtering for photocatalytic applications

dc.contributor.authorEscaliante, Lucas Caniati [UNESP]
dc.contributor.authorPereira, Andre Luis de Jesus
dc.contributor.authorAffonço, Lucas Jorge [UNESP]
dc.contributor.authorda Silva, Jose Humberto Dias [UNESP]
dc.contributor.institutionUniversidade Estadual Paulista (UNESP)
dc.contributor.institutionInstituto Tecnológico de Aeronáutica – ITA
dc.date.accessioned2022-04-28T19:42:05Z
dc.date.available2022-04-28T19:42:05Z
dc.date.issued2021-08-14
dc.description.abstractMultilayered TiO2/TiO2−x/TiO2 films, deposited by twenty periodical interruptions of O2 flow during reactive sputtering deposition were submitted to photocatalytic tests and characterized. The O2 flow interruptions lasted 10 s, 38 s, 45 s, and 70 s, while the regular flow periods lasted 540 s. The photocatalytic tests were performed using UV irradiation from a mercury lamp and a solution of methylene blue dye. The best photocatalytic response was observed in samples corresponding to 10 s interruptions. The results show that the amount of degraded dye was increased by an average of 1.67 times in the interrupted flow sample as compared to the homogeneous TiO2 film deposited under similar conditions. The results show that this relatively simple deposition procedure can produce significant improvements to the photocatalytic activity of the TiO2-based catalysts. Graphic abstract: [Figure not available: see fulltext.]en
dc.description.affiliationSchool of Sciences Graduate Program in Materials Science and Technology - POSMAT Universidade Estadual Paulista – UNESP
dc.description.affiliationPhysics Department Fundamental Sciences Division – IEF Instituto Tecnológico de Aeronáutica – ITA
dc.description.affiliationUnespSchool of Sciences Graduate Program in Materials Science and Technology - POSMAT Universidade Estadual Paulista – UNESP
dc.description.sponsorshipFundação de Amparo à Pesquisa do Estado de São Paulo (FAPESP)
dc.description.sponsorshipIdFAPESP: 2017/18916-2
dc.format.extent3096-3108
dc.identifierhttp://dx.doi.org/10.1557/s43578-021-00310-6
dc.identifier.citationJournal of Materials Research, v. 36, n. 15, p. 3096-3108, 2021.
dc.identifier.doi10.1557/s43578-021-00310-6
dc.identifier.issn2044-5326
dc.identifier.issn0884-2914
dc.identifier.scopus2-s2.0-85111145074
dc.identifier.urihttp://hdl.handle.net/11449/222042
dc.language.isoeng
dc.relation.ispartofJournal of Materials Research
dc.sourceScopus
dc.subjectCatalytic
dc.subjectLayered
dc.subjectSemiconducting
dc.subjectSputtering
dc.subjectThin film
dc.titleMultilayered TiO2/TiO2−x/TiO2 films deposited by reactive sputtering for photocatalytic applicationsen
dc.typeArtigopt
dspace.entity.typePublication
unesp.author.orcid0000-0002-7893-7771[1]
unesp.author.orcid0000-0003-4757-8080[2]
unesp.author.orcid0000-0001-7494-7406[3]
unesp.author.orcid0000-0003-0969-6481[4]
unesp.campusUniversidade Estadual Paulista (UNESP), Faculdade de Ciências, Baurupt

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