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A dynamic time-temperature-dependent process for thermal oxidation of Sn leading to SnOx thin films: Impedance spectroscopy study

dc.contributor.authorBarreira, Enzo A. [UNESP]
dc.contributor.authorPedrini, Luiz F. K. [UNESP]
dc.contributor.authorBoratto, Miguel H. [UNESP]
dc.contributor.authorScalvi, Luis V. A. [UNESP]
dc.contributor.institutionUniversidade Estadual Paulista (Unesp)
dc.date.accessioned2020-12-10T20:10:18Z
dc.date.available2020-12-10T20:10:18Z
dc.date.issued2020-07-30
dc.description.abstractTin dioxide (SnO2) thin films are obtained from resistive evaporation of metallic Sn followed by thermal oxidation at different temperatures in the range 200-500 degrees C. Results show that, besides the thickness of the evaporated Sn thin film, the oxidation process of Sn into SnO2 is highly dependent on the annealing time and temperature, presenting tin monoxide (SnO), as an intermediate compound, result of partial oxidation of the metallic Sn at intermediary time and temperature. The optical and electrical properties of the Sn thin films are altered by the oxidation degree of Sn into SnOx. These important characteristics are evaluated through UV-Vis, SEM, EDS, XRD and Impedance Spectroscopy. Increase in the optical bandgap energy as well as in the surface charge density, verified by electrical impedance, are observed on samples with higher annealing temperature and time, which indicate sequential oxidation process in these films.en
dc.description.affiliationUNESP Sao Paulo State Univ, Dept Phys FC, Bauru, SP, Brazil
dc.description.affiliationUNESP POSMAT, Postgrad Program Mat Sci & Technol, Bauru, SP, Brazil
dc.description.affiliationUnespUNESP Sao Paulo State Univ, Dept Phys FC, Bauru, SP, Brazil
dc.description.affiliationUnespUNESP POSMAT, Postgrad Program Mat Sci & Technol, Bauru, SP, Brazil
dc.description.sponsorshipConselho Nacional de Desenvolvimento Científico e Tecnológico (CNPq)
dc.description.sponsorshipFundação de Amparo à Pesquisa do Estado de São Paulo (FAPESP)
dc.description.sponsorshipIdFAPESP: 2019/00683-7
dc.description.sponsorshipIdFAPESP: 2013/07296-2
dc.description.sponsorshipIdFAPESP: 2017/20809-0
dc.format.extent13
dc.identifierhttp://dx.doi.org/10.1142/S0217979220501842
dc.identifier.citationInternational Journal Of Modern Physics B. Singapore: World Scientific Publ Co Pte Ltd, v. 34, n. 19, 13 p., 2020.
dc.identifier.doi10.1142/S0217979220501842
dc.identifier.issn0217-9792
dc.identifier.urihttp://hdl.handle.net/11449/197231
dc.identifier.wosWOS:000563093700010
dc.language.isoeng
dc.publisherWorld Scientific Publ Co Pte Ltd
dc.relation.ispartofInternational Journal Of Modern Physics B
dc.sourceWeb of Science
dc.subjectTin dioxide
dc.subjectresistive evaporation
dc.subjectoxidation
dc.subjectimpedance spectroscopy
dc.titleA dynamic time-temperature-dependent process for thermal oxidation of Sn leading to SnOx thin films: Impedance spectroscopy studyen
dc.typeArtigo
dcterms.rightsHolderWorld Scientific Publ Co Pte Ltd
dspace.entity.typePublication
unesp.departmentFísica - FCpt

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