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Study of copper complexes adsorbed on a silica gel surface chemically modified with 2-amino-1,3,4-thiadiazole

dc.contributor.authorDias, N. L.
dc.contributor.authorGushikem, Y.
dc.contributor.authorFranco, D. W.
dc.contributor.authorSchultz, M. S.
dc.contributor.authorVasconcellos, LCG
dc.contributor.institutionUniversidade Estadual de Campinas (UNICAMP)
dc.contributor.institutionUniversidade Estadual Paulista (Unesp)
dc.contributor.institutionUniversidade de São Paulo (USP)
dc.date.accessioned2014-05-20T13:29:30Z
dc.date.available2014-05-20T13:29:30Z
dc.date.issued1998-11-01
dc.description.abstractThe isotherms of adsorption of CuX2 (X=Cl-, Br-, ClO4-) by silica gel chemically modified with 2-amino-1,3,4-thiadiazole were studied in acetone and ethanol solutions: at 298 K. The following equilibria constants (in 1 mol(-1)) were determined: (a) CuCl2: 3.5 x 10(3) (ac), 2.0 x 10(3) (eth); (b) CuBr2: 2.8 x 10(3) (ac), 2.0 x 10(3) (eth); (c) Cu(ClO4)(2): 1.8 x 10(3) (ac), 1.0 x 10(3) (eth); ac = acetone, eth = ethanol. The electron spin resonance spectra of the surface complexes indicated a tetragonal distorted structure in the case of lower degrees of metal loading on the chemically modified surface. The d-d electronic transition spectra showed that for the ClO4-, complex, the peak of absorption did not change for any degree of metal loading, and for Cl- and Br- complexes, the peak maxima shifted to a higher energy region with a lower metal loading. (C) 1998 Elsevier B.V. B.V. All rights reserved.en
dc.description.affiliationUNICAMP, Inst Quim, BR-13083970 Campinas, SP, Brazil
dc.description.affiliationUNESP, Dept Fis & Quim, BR-15385000 Ilha Solteira, SP, Brazil
dc.description.affiliationUSP, Inst Quim, BR-13560250 Sao Carlos, SP, Brazil
dc.description.affiliationUnespUNESP, Dept Fis & Quim, BR-15385000 Ilha Solteira, SP, Brazil
dc.format.extent181-187
dc.identifierhttp://dx.doi.org/10.1016/S0927-7757(98)00333-1
dc.identifier.citationColloids and Surfaces A-physicochemical and Engineering Aspects. Amsterdam: Elsevier B.V., v. 141, n. 2, p. 181-187, 1998.
dc.identifier.doi10.1016/S0927-7757(98)00333-1
dc.identifier.issn0927-7757
dc.identifier.urihttp://hdl.handle.net/11449/9968
dc.identifier.wosWOS:000076133600004
dc.language.isoeng
dc.publisherElsevier B.V.
dc.relation.ispartofColloids and Surfaces A: Physicochemical and Engineering Aspects
dc.relation.ispartofjcr2.829
dc.relation.ispartofsjr0,753
dc.rights.accessRightsAcesso restrito
dc.sourceWeb of Science
dc.subjectcopper complex with 2-amino-1,3,4-thiadiazolept
dc.subjectelectron spin resonance of copper complexespt
dc.subjectsilica gelpt
dc.subjectsilica gel modified with 2-amino-1,3,4-thiadiazolept
dc.subject2-amino-1,3,4-thiadiazolept
dc.titleStudy of copper complexes adsorbed on a silica gel surface chemically modified with 2-amino-1,3,4-thiadiazoleen
dc.typeArtigo
dcterms.licensehttp://www.elsevier.com/about/open-access/open-access-policies/article-posting-policy
dcterms.rightsHolderElsevier B.V.
dspace.entity.typePublication
unesp.campusUniversidade Estadual Paulista (UNESP), Faculdade de Engenharia, Ilha Solteirapt
unesp.departmentFísica e Química - FEISpt

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