Electric force microscopy techniques on GaAs mesoscopic structures
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Data
2018-03-29
Autores
Lanzoni, Evandro Martin
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Universidade Estadual Paulista (Unesp)
Resumo
As técnicas de microscopia de sonda Kelvin (KPFM) e de microscopia de força eletrostática (EFM) são amplamente utilizadas para analisar a distribuição do potencial de superfície, porém com pouca aplicação em nanoestruturas semicondutoras auto-organizadas embutidas em um substrato. Neste trabalho, investigamos diretamente o acúmulo de carga dentro de estruturas mesoscópicas de GaAs (MGS) [1]. As estruturas são fabricadas através do crescimento sobreposto de um modelo de nano orifícios usando epitaxia de feixe molecular. Para tal, uma combinação de desoxidação assistida por Ga e ataque químico por gotículas localizadas foram utilizadas para criar orifícios iniciais com uma profundidade de ca. 10 a 15nm, que são posteriormente cobertos com 15nm de barreira AlxGax-1As e GaAs com 1nm, 2nm, 5nm, 10nm de espessura. Microscopia de força atômica e microscopia eletrônica de transmissão mostraram que a forma do orifício é preservada durante o crescimento de AlGaAs. Em seguida, esses orifícios são preenchidos com GaAs formando uma estrutura alongada sobre o buraco [1]. Investigamos o potencial de superfície local e a distribuição das cargas nestas estruturas com a técnica KPFM de passagem única. Portanto, uma voltagem AC de 5 V é aplicada a uma ponta metalizada e varremos a amostra no modo de contato intermitente. Observamos uma clara diferença de potencial na região central da estrutura, onde esperamos o furo preenchido. Então, um estudo sistemático com a técnica de KPFM mostrou a influência no acúmulo de carga quando a espessura de GaAs é alterada, bem como, quando modificamos a concentração de Al na barreira de AlGaAs. O cálculo simulando um poço de potencial com barreiras semi-finitas e finitas mostrou que não ocorre acúmulo de carga quando a espessura do GaAs é menor que 1,5 nm, corroborando com nossos resultados. Simulações do diagrama de banda e da densidade de elétron da estrutura permitem atribuir o acumulo de carga observado, aos diferentes níveis de energia da estrutura mesoscópica de GaAs em comparação com as camadas de GaAs circundantes.
Kelvin probe force microscopy and electric force microscopy techniques are widely used to analyze the distribution of the surface potential with little application to self-assembled semiconductor nanostructures embedded into a substrate. In this work, we directly investigate the charge accumulation inside mesoscopic GaAs structures [1]. The structures are fabricated by overgrowth of a nanohole template using molecular beam epitaxy. Therefore, a combination of Ga assisted deoxidation and local droplet etching is used to create initial holes with a depth of ca. 10 to 15nm, which are covered subsequently with 15nm of AlxGax-1As barrier and GaAs caps with 1nm, 2nm, 5nm, 10nm thicknesses. Atomic force microscopy and transmission electron microscopy results showed that the hole shape is preserved during the AlGaAs overgrowth. Then filled with GaAs forming an elongated mount over the hole [1]. We investigate the local potential and the charge distribution in these structures with a single pass Kelvin probe force microscopy technique. Therefore, an AC voltage of 5 V is applied to a metalized tip and scanned in tapping mode over the sample. We observed a clear potential difference in Kelvin probe force microscopy measurements in the middle of the structure, where we expect a filled hole. We systematically study by Kelvin probe force microscopy the influence on the charge accumulation when the GaAs thickness is changed, as well as the Al concentration in the AlGaAs barrier. Calculation of the particle in the box for semi-finite and finite barriers were done and show that no charge accumulation is observed for GaAs thickness lower than 1.5nm in the semi-finite barrier, corroborating with our results. Simulations of band gap and electron wavefunction of the structure allow us to ascribe the charge accumulation observed, to the different confinement of carriers inside of the unstrained mesoscopic GaAs structure compared to the surrounding GaAs layers.
Kelvin probe force microscopy and electric force microscopy techniques are widely used to analyze the distribution of the surface potential with little application to self-assembled semiconductor nanostructures embedded into a substrate. In this work, we directly investigate the charge accumulation inside mesoscopic GaAs structures [1]. The structures are fabricated by overgrowth of a nanohole template using molecular beam epitaxy. Therefore, a combination of Ga assisted deoxidation and local droplet etching is used to create initial holes with a depth of ca. 10 to 15nm, which are covered subsequently with 15nm of AlxGax-1As barrier and GaAs caps with 1nm, 2nm, 5nm, 10nm thicknesses. Atomic force microscopy and transmission electron microscopy results showed that the hole shape is preserved during the AlGaAs overgrowth. Then filled with GaAs forming an elongated mount over the hole [1]. We investigate the local potential and the charge distribution in these structures with a single pass Kelvin probe force microscopy technique. Therefore, an AC voltage of 5 V is applied to a metalized tip and scanned in tapping mode over the sample. We observed a clear potential difference in Kelvin probe force microscopy measurements in the middle of the structure, where we expect a filled hole. We systematically study by Kelvin probe force microscopy the influence on the charge accumulation when the GaAs thickness is changed, as well as the Al concentration in the AlGaAs barrier. Calculation of the particle in the box for semi-finite and finite barriers were done and show that no charge accumulation is observed for GaAs thickness lower than 1.5nm in the semi-finite barrier, corroborating with our results. Simulations of band gap and electron wavefunction of the structure allow us to ascribe the charge accumulation observed, to the different confinement of carriers inside of the unstrained mesoscopic GaAs structure compared to the surrounding GaAs layers.
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Palavras-chave
AFM, KPFM, EFM, MBE, Semiconductor, GaAs, AlGaAs