Effects of helium ion irradiation on fluorinated plasma polymers
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Data
2010-06-25
Autores
Lopes, Bruno B. [UNESP]
Schreiner, Wido
Davanzo, Celso U.
Durrant, Steven F. [UNESP]
Título da Revista
ISSN da Revista
Título de Volume
Editor
Elsevier B.V. Sa
Resumo
The effects of ion irradiation on fluorinated plasma polymer films are investigated using profilometry, surface contact-angle measurements, infrared reflection absorption spectroscopy (IRRAS) and X-ray photoelectron spectroscopy (XPS). Remarkably, helium plasma immersion ion implantation (PIII) of several amorphous hydrogenated fluorinated plasma polymers deposited from C(2)H(2)-SF(6), C(6)H(6)-SF(6) or C(6)F(6) produces film compactions of up to 40%, and modifies the surface energy in the 35 to 65 dyn cm(-1) range. As revealed by IRRAS and XPS, the films contain C-H, C-C, C=C, C=O, O-H and C-F groups. XPS spectra confirm the presence of N (typically similar to 5%). The films produced from SF(6)-containing plasmas also contain S. For irradiation times of 80 min, the film carbon content is increased, and the fluorine content is greatly reduced, by factors of about 3 to 15, depending on the initial film composition. (C) 2010 Elsevier B.V. All rights reserved.
Descrição
Palavras-chave
PECVD, Ion implantation, Fluorinated thin films, Plasma polymers, XPS, IRRAS
Como citar
Surface & Coatings Technology. Lausanne: Elsevier B.V. Sa, v. 204, n. 18-19, p. 3059-3063, 2010.