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dc.contributor.authorPillaca, E. J. D. M.
dc.contributor.authorUeda, M.
dc.contributor.authorKostov, K. G. [UNESP]
dc.contributor.authorReuther, H.
dc.date.accessioned2014-05-20T15:32:11Z
dc.date.available2014-05-20T15:32:11Z
dc.date.issued2012-10-01
dc.identifierhttp://dx.doi.org/10.1016/j.apsusc.2012.05.132
dc.identifier.citationApplied Surface Science. Amsterdam: Elsevier B.V., v. 258, n. 24, p. 9564-9569, 2012.
dc.identifier.issn0169-4332
dc.identifier.urihttp://hdl.handle.net/11449/41155
dc.description.abstractThe effect of magnetic field enhanced plasma immersion ion implantation (PIII) in silicon substrate has been investigated at low and high pulsed bias voltages. The magnetic field in magnetic bottle configuration was generated by two magnetic coils installed outside the vacuum chamber. The presence of both, electric and magnetic field in PIII creates a system of crossed E x B fields, promoting plasma rotation around the target. The magnetized electrons drifting in crossed E x B fields provide electron-neutral collision. Consequently, the efficient background gas ionization augments the plasma density around the target where a magnetic confinement is achieved. As a result, the ion current density increases, promoting changes in the samples surface properties, especially in the surface roughness and wettability and also an increase of implantation dose and depth. (C) 2012 Elsevier B. V. All rights reserved.en
dc.format.extent9564-9569
dc.language.isoeng
dc.publisherElsevier B.V.
dc.relation.ispartofApplied Surface Science
dc.sourceWeb of Science
dc.subjectPlasma immersion ion implantation with magnetic fielden
dc.subjectSiliconen
dc.subjectMagnetic mirror geometryen
dc.subjectCrossed E x B fieldsen
dc.titleStudy of plasma immersion ion implantation into silicon substrate using magnetic mirror geometryen
dc.typeArtigo
dcterms.licensehttp://www.elsevier.com/about/open-access/open-access-policies/article-posting-policy
dcterms.rightsHolderElsevier B.V.
dc.contributor.institutionInstituto Nacional de Pesquisas Espaciais (INPE)
dc.contributor.institutionUniversidade Estadual Paulista (Unesp)
dc.contributor.institutionInst Ion Beam Phys & Mat Res
dc.description.affiliationNatl Inst Space Res, Associated Lab Plasma, Sao Jose Dos Campos, S Paulo, Brazil
dc.description.affiliationState Univ São Paulo, Fac Engn, BR-12516410 Guaratingueta, Brazil
dc.description.affiliationInst Ion Beam Phys & Mat Res, D-01314 Dresden, Germany
dc.description.affiliationUnespState Univ São Paulo, Fac Engn, BR-12516410 Guaratingueta, Brazil
dc.identifier.doi10.1016/j.apsusc.2012.05.132
dc.identifier.wosWOS:000307729600011
dc.rights.accessRightsAcesso restrito
unesp.author.orcid0000-0002-9821-8088[3]
dc.relation.ispartofjcr4.439
dc.relation.ispartofsjr1,093
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