HMDSO plasma polymerization and thin film optical properties
MetadataShow full item record
Thin films were deposited from hexamethyldisiloxane (HMDSO) in a glow discharge supplied with radiofrequency (rf) power. Actino-metric optical emission spectroscopy was used to follow trends in the plasma concentrations of the species SiH (414.2 nm), CH (431.4 nm), CO (520.0 nm), and H (656.3 nm) as a function of the applied rf power (range 5 to 35 W). Transmission infrared spectroscopy (IRS) was employed to characterize the molecular structure of the polymer, showing the presence of Si-H, Si-O-Si, Si-O-C and C-H groups. The deposition rate, determined by optical interferometry, ranged from 60 to 130 nm/min. Optical properties were determined from transmission ultra violet-visible spectroscopy (UVS) data. The absorption coefficient α, the refractive index n, and the optical gap E04 of the polymer films were calculated as a function of the applied power. The refractive index at a photon energy of 1 eV varied from 1.45 to 1.55, depending on the rf power used for the deposition. The absorption coefficient showed an absorption edge similar to other non-crystalline materials, amorphous hydrogenated carbon, and semiconductors. For our samples, we define as an optical gap, the photon energy E04 corresponding to the energy at an absorption of 104 cm-1. The values of E04 decreased from 5.3 to 4.6 as the rf power was increased from 5 to 35 W. © 1995.
How to cite this document
Showing items related by title, author, creator and subject.
Optical and electrical properties of polymerizing plasmas and their correlation with DLC film properties Rangel, E. C.; da Cruz, N. C.; Kayama, M. E.; Rangel, RCC; Marins, N.; Durrant, S. F. (Plasmas and Polymers, 2004) [Artigo]Diamond-like carbon (DLC) films were grown from radiofrequency plasmas of acetylene-argon mixtures, at different excitation powers, P. The effects of this parameter on the plasma potential, electron density, electron ...
The improvement of thin polymer film properties through plasma immersion ion implantation and deposition technique Rangel, Elidiane C. ; Cruz, Nilson C. ; Mota, Rogério Pinto ; Algatti, Maurício A. ; Honda, Roberto Y. ; Kuranaga, Carlos ; Da Silva, Marcos D. (Materials Research Society Symposium Proceedings, 2001) [Trabalho apresentado em evento]Thin polymer films were deposited from acetylene and argon mixtures by plasma immersion ion implantation and deposition. The effect of the pulse frequency, v, on molecular structure, optical gap, contact angle and hardness ...
Caracterização de Filmes a-C:H:Cl e a-C:H:Si:Cl produzidos por deposição à vapor químico assistido por plasma (PECVD) e deposição e implantação iônica por imersão em plasma (PIIID) Rossi, Diego (Universidade Estadual Paulista (UNESP), 2015) [Dissertação de mestrado]Este trabalho tem por finalidade a deposição de filmes finos de carbono amorfo hidrogenado (a-C:H) e de filmes finos de carbono amorfo hidrogenado com silício (a-C:H:Si). Analisar a incorporação gradativa de cloro nos ...