Caracterização do diamante CVD depositado sob atmosfera com adição de baixa concentração de N2
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Data
2007-07-10
Autores
Bueno, Jomar Esteves [UNESP]
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Editor
Universidade Estadual Paulista (Unesp)
Resumo
Sendo um importante e emergente ramo dentro da área dos novos materiais, a deposição de filmes de diamante CVD tem despertado cada vez mais interesse na comunidade científica internacional. O propósito principal dessa dissertação é contribuir com os trabalhos de pesquisa sobre deposição de filmes de diamante CVD, assistidos por filamento quente. O desenvolvimento dos experimentos ocorreu utilizando-se amostras com substratos de Si, sobre as quais foram depositados diamante CVD, com adição de baixa concentração de N2 à mistura gasosa precursora. Optou-se pela baixa concentração, sendo esta uma condição desafiadora, com poucas informações disponíveis. As amostras resultantes dos experimentos foram caracterizadas através do MEV, DRX e EDX revelando, respectivamente uma morfologia com mesmo tamanho e formato dos cristais, confirmando ainda a presença de filme de diamante CVD, cujos cristais apresentaram dimensões uniformes e o filme formado teve cobertura de toda amostra. Assim verificou-se que com a adição de 0,75% em volume de N2 houve a deposição de diamante CVD de alta pureza cristalina, ou seja, de alta qualidade.
As an important and emergent material the CVD diamond has got the attention of the international scientific communities. This study is aimed at continuing the research about CVD diamond using a hot-filament reactor, analyzing its potential and possibilities of its technological applications. The development of the experiments were done on Si substrate samples and the growth process was studied with the introduction of small concentration of N2 in the feed gas mixture, during the diamond growth, in the hot-filament reactor by the chemical vapor deposition technique. The decision to choose a small concentration of N2 was taken because there are few papers and published results. The diamond samples were characterized by scanning electron microscopy and X-ray to verify the properties of the sample and also its morphology. The diamond growth in the nitrogen atmosphere resulted in crystals and thin films with similar morphology and dimensions. Therefore, by the characterization techniques it was verified that the addition of 0,75% in volume of N2 has resulted in a high crystalline purity CVD diamond deposition.
As an important and emergent material the CVD diamond has got the attention of the international scientific communities. This study is aimed at continuing the research about CVD diamond using a hot-filament reactor, analyzing its potential and possibilities of its technological applications. The development of the experiments were done on Si substrate samples and the growth process was studied with the introduction of small concentration of N2 in the feed gas mixture, during the diamond growth, in the hot-filament reactor by the chemical vapor deposition technique. The decision to choose a small concentration of N2 was taken because there are few papers and published results. The diamond samples were characterized by scanning electron microscopy and X-ray to verify the properties of the sample and also its morphology. The diamond growth in the nitrogen atmosphere resulted in crystals and thin films with similar morphology and dimensions. Therefore, by the characterization techniques it was verified that the addition of 0,75% in volume of N2 has resulted in a high crystalline purity CVD diamond deposition.
Descrição
Palavras-chave
Diamante, Filmes finos, Cristais, Nitrogenio, Diamond CVD, Thin films
Como citar
BUENO, Jomar Esteves. Caracterização do diamante CVD depositado sob atmosfera com adição de baixa concentração de N2. 2007. 83 f. Dissertação (mestrado) - Universidade Estadual Paulista, Faculdade de Engenharia de Guaratinguetá, 2007.