Deposition of SiOx Thin Films on Y-TZP by Reactive Magnetron Sputtering: Influence of Plasma Parameters on the Adhesion Properties Between Y-TZP and Resin Cement for Application in Dental Prosthesis
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Calvacanti de Queiroz, Jose Renato [UNESP]
Duarte, Diego Alexandre
de Assuncao e Souza, Rodrigo Othavio
Fissmer, Sara Fernanda
Bottino, Marco Antonio [UNESP]
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Universidade Federal de São Carlos (UFSCar), Dept Engenharia Materials
In this paper SiOx thin films were deposited on Y-TZP ceramics by reactive magnetron sputtering technique in order to improve the adhesion properties between Y-TZP and resin cement for applications in dental prosthesis. For fixed cathode voltage, target current, working pressure and target-to-substrate distance, SiOx thin films were deposited at different oxygen concentrations in the Ar+O-2 plasma forming gas. After deposition processes, SiOx thin films were characterized by profilometry, energy dispersive spectroscopy (EDS), optical microscopy and scanning electron microscopy (SEM). Adhesion properties between Y-TZP and resin cement were evaluated by shear testing. Results indicate that films deposited at 20%O-2 increased the bond strength to (32.8 +/- 5.4) MPa. This value has not been achieved by traditional methods.
Y-TZP, dental material, thin films, silicon oxide
Materials Research-ibero-american Journal of Materials. São Carlos: Universidade Federal de São Carlos (UFSCar), Dept Engenharia Materials, v. 14, n. 2, p. 212-216, 2011.