Publicação:
Role of the reactive sputtering deposition power in the phase control of cobalt oxide films

dc.contributor.authorAzevedo Neto, Nilton Francelosi [UNESP]
dc.contributor.authorLeite, Douglas M. G.
dc.contributor.authorLisboa-Filho, Paulo N. [UNESP]
dc.contributor.authorSilva, Jose H. D. da [UNESP]
dc.contributor.institutionUniversidade Estadual Paulista (Unesp)
dc.contributor.institutionInst Tecnol Aeronaut
dc.date.accessioned2019-10-03T18:20:12Z
dc.date.available2019-10-03T18:20:12Z
dc.date.issued2018-11-01
dc.description.abstractThe influence of the reactive magnetron sputtering deposition power on determining the stoichiometry and structure of cobalt oxide polycrystalline films is investigated using experimental and simulated data. Direct current discharges with powers in the 80-240 W range are tested using a metallic Co target and an Ar + O-2 plasma. X-ray diffraction results show that lower deposition powers favor the spinel Co3O4 phase, while higher powers produce films presenting the rocksalt CoO phase. Computer simulations indicate that lower power processes occur in the poisoned target regime, while higher power depositions favor the metallic target regime. Consistent with the simulations, oxygen optical emissions (O-I = 777: 3 m) from the plasma show a significant decrease while the cobalt emissions (e. g., the Co-I = 340: 5 nm line) are significantly increased when the deposition power is increased. The results show that the film stoichiometry and structure are directly related to the deposition power, at constant O-2 flow. Published by the AVS.en
dc.description.affiliationUniv Estadual Paulista, Fac Ciencias, BR-17033360 Sao Paulo, Brazil
dc.description.affiliationInst Tecnol Aeronaut, LPP, BR-12228900 Sao Paulo, Brazil
dc.description.affiliationUnespUniv Estadual Paulista, Fac Ciencias, BR-17033360 Sao Paulo, Brazil
dc.description.sponsorshipFundação de Amparo à Pesquisa do Estado de São Paulo (FAPESP)
dc.description.sponsorshipLNNano
dc.description.sponsorshipFINEP
dc.description.sponsorshipIdFAPESP: 2017/18916-2
dc.description.sponsorshipIdLNNano: LMF-15809
dc.description.sponsorshipIdFINEP: 01.13.0328.00
dc.format.extent8
dc.identifierhttp://dx.doi.org/10.1116/1.5046952
dc.identifier.citationJournal Of Vacuum Science & Technology A. Melville: A V S Amer Inst Physics, v. 36, n. 6, 8 p., 2018.
dc.identifier.doi10.1116/1.5046952
dc.identifier.issn0734-2101
dc.identifier.lattes1353862414532005
dc.identifier.orcid0000-0002-7734-4069
dc.identifier.urihttp://hdl.handle.net/11449/184142
dc.identifier.wosWOS:000451272500033
dc.language.isoeng
dc.publisherA V S Amer Inst Physics
dc.relation.ispartofJournal Of Vacuum Science & Technology A
dc.rights.accessRightsAcesso aberto
dc.sourceWeb of Science
dc.titleRole of the reactive sputtering deposition power in the phase control of cobalt oxide filmsen
dc.typeArtigo
dcterms.rightsHolderA V S Amer Inst Physics
dspace.entity.typePublication
unesp.author.lattes1353862414532005[3]
unesp.author.orcid0000-0002-7734-4069[3]

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