Al-doping and Properties of AZO Thin Films Grown at Room Temperature: Sputtering Pressure Effect

dc.contributor.authorChaves, Michel [UNESP]
dc.contributor.authorRamos, Raul [UNESP]
dc.contributor.authorMartins, Everson [UNESP]
dc.contributor.authorRangel, Elidiane Cipriano [UNESP]
dc.contributor.authorCruz, Nilson Cristino da [UNESP]
dc.contributor.authorDurrant, Steven Frederick [UNESP]
dc.contributor.authorRibeiro Bortoleto, Jose Roberto [UNESP]
dc.contributor.institutionUniversidade Estadual Paulista (Unesp)
dc.date.accessioned2019-10-06T01:07:08Z
dc.date.available2019-10-06T01:07:08Z
dc.date.issued2019-01-01
dc.description.abstractAluminum zinc oxide (AZO) thin films were synthesized on glass substrates by radio frequency (rf) magnetron sputtering from a metallic Zn-Al (5 at. %) target at room temperature. The morphological, structural, electrical and optical properties of the films were studied as a function of the sputtering pressure, which was varied from 0.1 to 6.7 Pa. X-ray diffraction (XRD) analyses revealed that the films obtained were polycrystalline, having a hexagonal wurtzite structure with a preferential orientation in the (002) plane. In addition, the crystallite size increased as a function of sputtering pressure. Owing to the re-sputtering of the Zn atoms from the growing film, the aluminum concentration presented a maximum value of 13 at. %. At pressures close to 0.16 Pa, we obtained films with values of electrical resistivity and mobility of 2.8 10(-3) Omega cm and 17 cm(2)/Vs, respectively. Finally, our results indicate that the structure zone diagram proposed by Thornton and later modified by Kluth does not fully predict the structural/morphological behavior of the AZO films, since plasma interactions must also be taken into account. With the methodology used, transparent conductive electrodes can be deposited on substrates at low temperatures.en
dc.description.affiliationUniv Estadual Paulista, UNESP, Inst Ciencia & Tecnol Sorocaba, Ave Tres Marco 511, BR-18087180 Sorocaba, SP, Brazil
dc.description.affiliationUnespUniv Estadual Paulista, UNESP, Inst Ciencia & Tecnol Sorocaba, Ave Tres Marco 511, BR-18087180 Sorocaba, SP, Brazil
dc.description.sponsorshipCoordenação de Aperfeiçoamento de Pessoal de Nível Superior (CAPES)
dc.description.sponsorshipFundação de Amparo à Pesquisa do Estado de São Paulo (FAPESP)
dc.description.sponsorshipConselho Nacional de Desenvolvimento Científico e Tecnológico (CNPq)
dc.description.sponsorshipIdFAPESP: 2008/53311-5
dc.description.sponsorshipIdFAPESP: 2014/21594-9
dc.description.sponsorshipIdCNPq: 555774/2010-4
dc.description.sponsorshipIdCNPq: 301622/2012-4
dc.format.extent8
dc.identifierhttp://dx.doi.org/10.1590/1980-5373-MR-2018-0665
dc.identifier.citationMaterials Research-ibero-american Journal Of Materials. Sao Carlos: Univ Fed Sao Carlos, Dept Engenharia Materials, v. 22, n. 3, 8 p., 2019.
dc.identifier.doi10.1590/1980-5373-MR-2018-0665
dc.identifier.fileS1516-14392019000200239.pdf
dc.identifier.issn1516-1439
dc.identifier.lattes7780445976263017
dc.identifier.lattes7780445976263017(3)
dc.identifier.lattes7157327220048138
dc.identifier.scieloS1516-14392019000200239
dc.identifier.urihttp://hdl.handle.net/11449/186744
dc.identifier.wosWOS:000467689900001
dc.language.isoeng
dc.publisherUniv Fed Sao Carlos, Dept Engenharia Materials
dc.relation.ispartofMaterials Research-ibero-american Journal Of Materials
dc.rights.accessRightsAcesso aberto
dc.sourceWeb of Science
dc.subjectZnO:Al thin films
dc.subjectTCO
dc.subjectmorphological properties
dc.subjectstructure zone diagram
dc.subjectroom temperature
dc.titleAl-doping and Properties of AZO Thin Films Grown at Room Temperature: Sputtering Pressure Effecten
dc.typeArtigo
dcterms.rightsHolderUniv Fed Sao Carlos, Dept Engenharia Materials
unesp.author.lattes7157327220048138
unesp.author.orcid0000-0002-4511-3768[6]

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