Foschini, C. R.Longo, Elson [UNESP]Varela, José Arana [UNESP]Desu, S. B.2014-05-202014-05-201999-07-26Applied Physics Letters. Woodbury: Amer Inst Physics, v. 75, n. 4, p. 552-554, 1999.0003-6951http://hdl.handle.net/11449/33393BaBi2Ta2O9 thin films having a layered structure were fabricated by metalorganic solution deposition technique. The films exhibited good structural, dielectric, and insulating properties. The room temperature resistivity was found to be in the range of 10(12)-10(14) Omega cm up to 4 V corresponding to a field of 200 kV/cm across the capacitor for films annealed in the temperature range of 500-700 degrees C. The current-voltage (I-V) characteristics as a function of thickness for films annealed at 700 degrees C for 1 h, indicated bulk limited conduction and the log(I) vs V-1/2 characteristics suggested a space-charge-limited conduction mechanism. The capacitance-voltage measurements on films in a metal-insulator-semiconductor configuration indicated good Si/BaBi2Ta2O9 interface characteristics and a SiO2 thickness of similar to 5 nm was measured and calculated. (C) 1999 American Institute of Physics. [S0003-6951(99)00830-X].552-554engArtigo10.1063/1.124419WOS:000081570400039Acesso abertoWOS000081570400039.pdf19223571848427670000-0003-1300-4978