Andresa, Juliana SalvadorReis, Rafael MachadoGonzalez, Eduardo Perez [UNESP]Santos, Leonardo SilvaEberlin, Marcos NogueiraNascente, Pedro Augusto de PaulaTanimoto, Sonia TomieMachado, Sergio Antonio SpinolaRodrigues-Filho, Ubirajara P.2014-05-272014-05-272005-06-01Journal of Colloid and Interface Science, v. 286, n. 1, p. 303-309, 2005.0021-9797http://hdl.handle.net/11449/68247The present paper describes the one-pot procedure for the formation of self-assembled thin films of two silanes on the model oxidized silicon wafer, SiO2/Si. SiO2/Si is a model system for other surfaces, such as glass, quartz, aerosol, and silica gel. MALDI-TOF MS with and without a matrix, XPS, and AFM have confirmed the formation of self-assembled thin films of both 3-imidazolylpropyltrimethoxysilane (3-IPTS) and 4-(N- propyltriethoxysilane-imino)pyridine (4-PTSIP) on the SiO2/Si surface after 30 min. Longer adsorption times lead to the deposition of nonreacted 3-IPTS precursors and the formation of agglomerates on the 3-IPTS monolayer. The formation of 4-PTSIP self-assembled layers on SiO2/Si is also demonstrated. The present results for the flat SiO2/Si surface can lead to a better understanding of the formation of a stationary phase for affinity chromatography as well as transition-metal-supported catalysts on silica and their relationship with surface roughness and ordering. The 3-IPTS and 4-PTSIP modified SiO2/Si wafers can also be envisaged as possible built-on-silicon thin-layer chromatography (TLC) extraction devices for metal determination or N-heterocycle analytes, such as histidine and histamine, with on-spot MALDI-TOF MS detection. © 2005 Elsevier Inc. All rights reserved.303-309eng3-Imidazolylpropyltrimethoxysilane4-(N-Propyltriethoxysilane-imino) pyridineAFMMALDI-TOF MSSelf-assembled thin filmsSilicon dioxideSilicon waferXPSAerosolsAgglomerationGlassMathematical modelsMonolayersOxidationQuartzSelf assemblySilanesSilicaSurface chemistryThin filmsThin layer chromatographyModel systemsNitrogenated Lewis basesOxidized silicon wafersAdsorptionheterocyclic compoundhistaminehistidineLewis basesilane derivativesilicon dioxidetransition elementadsorptionaffinity chromatographyatomic force microscopychemical modelchemical reactionfilmmatrix assisted laser desorption ionization time of flight mass spectrometrymetal extractionnitrationoxidation kineticsphase transitionpriority journalreaction analysisthin layer chromatographyX ray powder diffractionArtigo10.1016/j.jcis.2005.01.019Acesso restrito2-s2.0-177443711646796683603864969