Basho, É N.Sakai, R. T.Da Cruz, F. M D L [UNESP]De Melo, H. G.Benedetti, Assis Vicente [UNESP]Suegama, P. H.2014-05-272014-05-272012-12-01ECS Transactions, v. 43, n. 1, p. 3-7, 2012.1938-58621938-6737http://hdl.handle.net/11449/73842This work studied the influence of the rare earth (Ce3+ and Ce4+) elements concentration in polysiloxane flints deposited on copper by dip-coating process, and evaluated their resistance in a 3.5 wt.% NaCl medium. Classical electrochemistry techniques were used as open circuit potential, polarization curves and electrochemical impedance spectroscopy. The results revealed that by adding low concentration of Ce4+ ions, the coating prevents the electrolyte uptake any longer retarding the substrate degradation consequently. ©The Electrochemical Society.3-7engCopper surfaceDip-coating processLow concentrationsOpen circuit potentialPolarization curvesSubstrate degradationCopperDegradationElectrochemical impedance spectroscopyElectrochemistrySilicon compoundsSiliconesCoatingsTrabalho apresentado em evento10.1149/1.4704931Acesso aberto2-s2.0-84879436516