Malheiros-Silveira, G. N. [UNESP]Finardi, C. A.Van Etten, E. A. M. A.Burger, T. S.Silva, R. C. G. daDaltrini, A. M.Panepucci, R. R.IEEE2019-10-042019-10-042018-01-012018 Sbfoton International Optics And Photonics Conference (sbfoton Iopc). New York: Ieee, 3 p., 2018.http://hdl.handle.net/11449/184348Development of polymer inverted-rib waveguides based on high-volume CMOS foundry process is presented. Simulation of waveguiding structures using a basic inverted waveguide manufacturing process showed that viable devices can be obtained. Full wafers were processed at the foundry's 150 mm-facility. Photomask layout and manufacturing as well as wafer post-processing and characterization were carried out. As preliminary results, spectral filters based on integrated ring resonators with free spectral range (FSR) of 1 nm are presented.3engoptical device fabricationoptical polymersoptical resonatorsFoundry Polymer-Based Inverted-Rib WaveguidesTrabalho apresentado em eventoWOS:000458662800022Acesso aberto