Investigação de propriedades de filmes finos de Sn'O IND. 2' e 'Al IND. 2''O IND. 3' para aplicação em dispositivos
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Data
2010-02-18
Autores
Maciel Júnior, Jorge Luiz Barbosa [UNESP]
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Editor
Universidade Estadual Paulista (Unesp)
Resumo
A proposta deste trabalho é a investigação das propriedades elétricas e ópticas de filmes finos de dióxido de estanho (Sn'O IND. 2') obtidos via sol-gel e por solução alcoólica depositados via dip-coating, e, filmes de alumina ('Al IND. 2''O IND. 3') obtidos por deposição de filmes de alumínio (Al) via evaporação resistiva e tratamento térmico em diferentes ambientes, para promover a oxidação de Al. A investigação individual quanto às propriedades ópticas e elétricas desses materiais conhecer seu comportamento na forma de filmes, e estudar a região interfacial de Sn'O IND. 2' e 'Al IND. 2''O IND. 3'. As caracterizações estruturais dos filmes foram feitas por difração de raios-X (DRX), e, no caso dos filmes de alumina, utilizou-se também microscopia eletrônica de varredura (MEV) e microscopia óptica. Nas caracterizações ópticas foram utilizadas técnicas de espectroscopia na região do ultravioleta e no infravermelho próximo (UV-Vis-Nir). Tanto os filmes obtidos por meio alcoólico como obtidos via SGDC foram caracterizados como sendo de Sn'O IND. 2' de estrutura tetragonal do tipo rutilo, sendo que os filmes obtidos via processo alcoólico apresentaram condutividade elétrica maior do que os filmes obtidos via SGDC. Os resultados referentes aos filmes finos de alumínio indicam que independentemente da quantidade de camadas de alumínio depositadas e da atmosfera de tratamento térmico, tem-se a oxidação do alumínio à alumina ('Al IND. 2''O IND. 3'), sendo que a estrutura dominante depende da atmosfera de tratamento. A sua utilização como camada isolante no gate em dispositivo metal-óxido-semicondutor é viável, pois a corrente fonte-dreno apresenta valores significativamente maiores do que a corrente fonte-gate.
The main goal of this work is the investigation of properties of tin dioxide (Sn'O IND. 2') and alumina ('Al IND. 2''O IND. 3) thin films. The first one was obtained through the sol-gel process as well as alcoholic solution, via dip-coating. The alumina thin films were obtained by resistive evaporation of aluminum (Al) followed by thermal annealing in distinct atmospheres, to promote the Al oxidation. The individual investigation of optical and electrical properties of these materials aims the knowledge of their behavior as thin films, which allows studying the interface layer of the heterojunction Sn'O IND. 2' e 'Al IND. 2''O IND. 3'. Structural characterization of films was carried out by X-ray diffraction (XRD) technique and particularly on the alumina films, scanning electron microscopy (SEM) and optical microscopy were done. For the optical characterization, wide spectra were obtained, with spectroscopy from ultraviolet to near infrared (UV-Vis-Nir). Either the films obtained in the alcoholic solution as well as via SGDC, where characterized as Sn'O IND. 2' of tetragonal structure of rutile type, and the films obtained through alcoholic process present electrical conductivity higher than the films obtained via SGDC. Results on aluminum thin films indicate that independent on the amount of deposited aluminum and thermal annealing atmosphere, the oxidation of aluminum to alumina ('Al IND. 2''O IND. 3) takes place, but the dominant alumina structure depends on the thermal annealing atmosphere. Besides, its utilization as insulating layer at the gate of a metal-oxide semicondutor device is achievable, because the source-drain current is significantly higher than the source-gate current.
The main goal of this work is the investigation of properties of tin dioxide (Sn'O IND. 2') and alumina ('Al IND. 2''O IND. 3) thin films. The first one was obtained through the sol-gel process as well as alcoholic solution, via dip-coating. The alumina thin films were obtained by resistive evaporation of aluminum (Al) followed by thermal annealing in distinct atmospheres, to promote the Al oxidation. The individual investigation of optical and electrical properties of these materials aims the knowledge of their behavior as thin films, which allows studying the interface layer of the heterojunction Sn'O IND. 2' e 'Al IND. 2''O IND. 3'. Structural characterization of films was carried out by X-ray diffraction (XRD) technique and particularly on the alumina films, scanning electron microscopy (SEM) and optical microscopy were done. For the optical characterization, wide spectra were obtained, with spectroscopy from ultraviolet to near infrared (UV-Vis-Nir). Either the films obtained in the alcoholic solution as well as via SGDC, where characterized as Sn'O IND. 2' of tetragonal structure of rutile type, and the films obtained through alcoholic process present electrical conductivity higher than the films obtained via SGDC. Results on aluminum thin films indicate that independent on the amount of deposited aluminum and thermal annealing atmosphere, the oxidation of aluminum to alumina ('Al IND. 2''O IND. 3) takes place, but the dominant alumina structure depends on the thermal annealing atmosphere. Besides, its utilization as insulating layer at the gate of a metal-oxide semicondutor device is achievable, because the source-drain current is significantly higher than the source-gate current.
Descrição
Palavras-chave
Filmes finos, Dióxido de estanho, Alumina, Evaporação resistiva, Molhamento, Tin dioxide, Resistive evaporation
Como citar
MACIEL JÚNIOR, Jorge Luiz Barbosa. Investigação de propriedades de filmes finos de Sn'O IND. 2' e 'Al IND. 2''O IND. 3' para aplicação em dispositivos. 2010. 110 f. Dissertação (mestrado) - Universidade Estadual Paulista, Faculdade de Ciências de Bauru, 2010.