Síntese e caracterização estrutural de filmes finos Bi4Ti3O12
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Data
2007-04-27
Autores
Nahime, Bacus de Oliveira [UNESP]
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Editor
Universidade Estadual Paulista (Unesp)
Resumo
Na última década, cresceu consideravelmente o interesse pela produção de filmes finos ferroelétricos, em virtude do grande potencial que estes materiais apresentam para a produção de dispositivos de memória ferroelétrica não-voláteis. O titanato de bismuto, Bi4Ti3O12 (BIT) é um ferroelétrico com estruturas de camadas de bismuto, conhecido por apresentar elevada temperatura de Curie (Tc), próxima de 650ºC, e excelentes propriedades de fadiga ferroelétrica. Este trabalho teve como objetivo a síntese de filmes finos de BIT e o estudo das suas propriedades estruturais. Os filmes estudados foram preparados a partir de um método químico, similar ao método Pechini, e depositados sobre substratos de Si(100). Os filmes foram cristalizados em forno convencional entre 500°C e 700°C, por períodos entre 1 e 12 horas. As técnicas de difração de raios-X (DRX) e Espectroscopia no Infravermelho por Transformada Fourier (FT-IR), foram usadas como ferramentas de investigação. Para os filmes tratados termicamente entre 400°C e 700°C, observouse a presença das fases cristalinas Bi4Ti3O12 e Bi2Ti2O7 (paraelétrica). Para os filmes tratados termicamente a temperaturas mais elevadas (700°C) e tempos mais prolongados (10 horas), observou-se uma tendência de desaparecer a fase Bi2Ti2O17. Aliados a estes resultados, o aumento da intensidade do pico (117) do BIT e o decréscimo da sua respectiva largura a meia altura, para os filmes cristalizados a 700°C, sugerem que nestas condições são obtidos filmes mais bem cristalizados. Um estudo usando a técnica FT-IR demonstrou a presença de uma banda de absorção claramente evidenciada em torno de 700 cm-1. Esta banda está associada ao modo stretching da ligação Ti-O e torna-se consideravelmente mais estreita quando a resina polimérica precursora foi tratada termicamente a temperaturas mais elevadas. Este fato também comprovou que temperaturas em torno de 700°C são favoráveis para a...
In the last decade the interest for the production of ferroelectric thin films increased considerably because of the great potential that these materials present for the production of devices of no-volatile ferroelectric memory. The bismuth titanate, Bi4Ti3O12 (BIT), is a ferroelectric with structures of bismuth layers, known by presenting high temperature of Curie (Tc), close of 650ºC, and excellent properties of ferroelectric fatigue. This work had as objectives the synthesis of thin films of BIT and the study of their structural properties. The studied films were prepared starting from a chemical method, similar to the Pechini method, and deposited on substrata of Si(100). The films were crystallized in conventional oven between 500°C and 700°C for periods between 1 and 12 hours. The techniques of X-ray diffraction (DRX) and Fourier Transform Infrared (FT-IR) Spectroscopy were used as investigation tools. It was observed the presence of the crystalline phases Bi4Ti3O12 and Bi2Ti2O7 (paraelectric) for the films termically treated between 400°C and 700°C. To the films termically treated to higher temperatures (700°C) and more lingering times (10 hours) a tendency of the phase Bi2Ti2O7 to disappear was observed. Allied to these results, the increase of the intensity of the pick (117) of the BIT and the decrease of its respective width to half height, for the crystallized films to 700°C suggests that, in these conditions, better crystallized films are obtained. A study using the FT-IR technique demonstrated the presence of an absorption band clearly evidenced around 700 cm-1. This band is associated to the stretching way of the Ti-O connection and becomes considerably narrower when the precursory polimeric resin was termically treated to higher temperatures. This fact also proved that temperatures around 700°C are favorable for obtaining a mono-crystalline phase of Bi4Ti3O12.
In the last decade the interest for the production of ferroelectric thin films increased considerably because of the great potential that these materials present for the production of devices of no-volatile ferroelectric memory. The bismuth titanate, Bi4Ti3O12 (BIT), is a ferroelectric with structures of bismuth layers, known by presenting high temperature of Curie (Tc), close of 650ºC, and excellent properties of ferroelectric fatigue. This work had as objectives the synthesis of thin films of BIT and the study of their structural properties. The studied films were prepared starting from a chemical method, similar to the Pechini method, and deposited on substrata of Si(100). The films were crystallized in conventional oven between 500°C and 700°C for periods between 1 and 12 hours. The techniques of X-ray diffraction (DRX) and Fourier Transform Infrared (FT-IR) Spectroscopy were used as investigation tools. It was observed the presence of the crystalline phases Bi4Ti3O12 and Bi2Ti2O7 (paraelectric) for the films termically treated between 400°C and 700°C. To the films termically treated to higher temperatures (700°C) and more lingering times (10 hours) a tendency of the phase Bi2Ti2O7 to disappear was observed. Allied to these results, the increase of the intensity of the pick (117) of the BIT and the decrease of its respective width to half height, for the crystallized films to 700°C suggests that, in these conditions, better crystallized films are obtained. A study using the FT-IR technique demonstrated the presence of an absorption band clearly evidenced around 700 cm-1. This band is associated to the stretching way of the Ti-O connection and becomes considerably narrower when the precursory polimeric resin was termically treated to higher temperatures. This fact also proved that temperatures around 700°C are favorable for obtaining a mono-crystalline phase of Bi4Ti3O12.
Descrição
Palavras-chave
Cristais ferroeletricos, Filmes finos, Bismuto, Ferroelectric, Thin films, Bismuth titanate
Como citar
NAHIME, Bacus de Oliveira. Síntese e caracterização estrutural de filmes finos Bi4Ti3O12. 2007. 61 f. Dissertação (mestrado) - Universidade Estadual Paulista, Faculdade de Engenharia de Ilha Solteira, 2007.