Developments in hot-filament metal oxide deposition (HFMOD)

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dc.contributor.authorDurrant, Steven F. [UNESP]
dc.contributor.authorTrasferetti, Benedito C.
dc.contributor.authorScanninio, Jair
dc.contributor.authorDavanzo, Celso U.
dc.contributor.authorRouxinol, Francisco P. M.
dc.contributor.authorGelamo, Rogerio V.
dc.contributor.authorde Moraes, Mario A. Bica
dc.contributor.institutionUniversidade Estadual Paulista (Unesp)
dc.contributor.institutionSuperintendencia Reg Piaui
dc.contributor.institutionUniversidade Estadual de Londrina (UEL)
dc.contributor.institutionUniversidade Estadual de Campinas (UNICAMP)
dc.date.accessioned2014-05-20T15:31:45Z
dc.date.available2014-05-20T15:31:45Z
dc.date.issued2008-01-15
dc.description.abstractHot-filament metal oxide deposition (HFMOD) is a variant of conventional hot-filament chemical vapor deposition (HFCVD) recently developed in our laboratory and successfully used to obtain high-quality, uniform films of MOx WOx and VOx. The method employs the controlled oxidation of a filament of a transition metal heated to 1000 degrees C or more in a rarefied oxygen atmosphere (typically, of about 1 Pa). Metal oxide vapor formed on the surface of the filament is transported a few centimetres to deposit on a suitable substrate. Key system parameters include the choice of filament material and diameter, the applied current and the partial pressures of oxygen in the chamber. Relatively high film deposition rates, such as 31 nm min(-1) for MoOx, are obtained. The film stoichiometry depends on the exact deposition conditions. MoOx films, for example, present a mixture of MoO2 and MoO3 phases, as revealed by XPS. As determined by Li+ intercalation using an electrochemical cell, these films also show a colouration efficiency of 19.5 cm(2) C-1 at a wavelength of 700 nm. MOx and WOx films are promising in applications involving electrochromism and characteristics of their colouring/bleaching cycles are presented. The chemical composition and structure of VOx films examined using IRRAS (infrared reflection-absorption spectroscopy), RBS (Rutherford backscattering spectrometry) and XPS (X-ray photoelectron spectrometry) are also presented. (c) 2007 Elsevier B.V. All rights reserved.en
dc.description.affiliationUniv Estadual Paulista, Lab Plasmas Tecnol, BR-18087180 Sorocaba, Brazil
dc.description.affiliationSuperintendencia Reg Piaui, Dept Policia Fed, Teresina, PI, Brazil
dc.description.affiliationUniversidade Estadual de Londrina (UEL), Dept Fis, BR-86051990 Londrina, PR, Brazil
dc.description.affiliationUniv Estadual Campinas, Inst Quim, BR-13083970 Campinas, SP, Brazil
dc.description.affiliationUniv Estadual Campinas, Inst Fis Gleb Wataghin, Dept Fis Aplicada, Lab Proc Plasma, BR-13083970 Campinas, SP, Brazil
dc.description.affiliationUnespUniv Estadual Paulista, Lab Plasmas Tecnol, BR-18087180 Sorocaba, Brazil
dc.format.extent789-793
dc.identifierhttp://dx.doi.org/10.1016/j.tsf.2007.06.183
dc.identifier.citationThin Solid Films. Lausanne: Elsevier B.V. Sa, v. 516, n. 5, p. 789-793, 2008.
dc.identifier.doi10.1016/j.tsf.2007.06.183
dc.identifier.issn0040-6090
dc.identifier.orcid0000-0002-4511-3768
dc.identifier.urihttp://hdl.handle.net/11449/40801
dc.identifier.wosWOS:000252285900075
dc.language.isoeng
dc.publisherElsevier B.V. Sa
dc.relation.ispartofThin Solid Films
dc.relation.ispartofjcr1.939
dc.relation.ispartofsjr0,617
dc.rights.accessRightsAcesso restrito
dc.sourceWeb of Science
dc.subjecthot-wire CVDen
dc.subjectelectrochromismen
dc.subjecttungsten oxideen
dc.subjectmolybdenum oxideen
dc.subjectvanadium oxideen
dc.subjectthin filmsen
dc.titleDevelopments in hot-filament metal oxide deposition (HFMOD)en
dc.typeArtigo
dcterms.licensehttp://www.elsevier.com/about/open-access/open-access-policies/article-posting-policy
dcterms.rightsHolderElsevier B.V. Sa
unesp.author.orcid0000-0002-4511-3768[1]
unesp.campusUniversidade Estadual Paulista (Unesp), Instituto de Ciência e Tecnologia, Sorocabapt

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