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Control of retention and fatigue-free characteristics in CaBi4Ti4O15 thin films prepared by chemical method

dc.contributor.authorSimoes, A. Z.
dc.contributor.authorRamirez, M. A.
dc.contributor.authorGonzalez, AHM
dc.contributor.authorRiccardi, C. S.
dc.contributor.authorRies, A.
dc.contributor.authorLongo, Elson [UNESP]
dc.contributor.authorVarela, José Arana [UNESP]
dc.contributor.institutionUniversidade Estadual Paulista (Unesp)
dc.date.accessioned2014-05-20T15:20:27Z
dc.date.available2014-05-20T15:20:27Z
dc.date.issued2006-07-01
dc.description.abstractFerroelectric CaBi4Ti4O15 (CBTi144) thin films were deposited on Pt/Ti/SiO2/Si substrates by the polymeric precursor method. The films present a single phase of layered-structured perovskite with polar axis orientation after annealing at 700 degrees C for 2 h in static air and oxygen atmosphere. The a/b-axis orientation of the ferroelectric film is considered to be associated with the preferred orientation of the Pt bottom electrode. It is noted that the films annealed in static air showed good polarization fatigue characteristics at least up to 10(10) bipolar pulse cycles and excellent retention properties up to 10(4) s. on the other hand, oxygen atmosphere seems to be crucial in the decrease of both, fatigue and retention characteristics of the capacitors. Independently of the applied electric field, the retained switchable polarization approached a nearly steady-state value after a retention time of 10 s. (C) 2006 Elsevier B.V. All rights reserved.en
dc.description.affiliationUniv Estadual Paulista UNESP, Inst Chem, BR-14801970 Araraquara, SP, Brazil
dc.description.affiliationUnespUniv Estadual Paulista UNESP, Inst Chem, BR-14801970 Araraquara, SP, Brazil
dc.format.extent2206-2211
dc.identifierhttp://dx.doi.org/10.1016/j.jssc.2006.04.027
dc.identifier.citationJournal of Solid State Chemistry. San Diego: Academic Press Inc. Elsevier B.V., v. 179, n. 7, p. 2206-2211, 2006.
dc.identifier.doi10.1016/j.jssc.2006.04.027
dc.identifier.issn0022-4596
dc.identifier.urihttp://hdl.handle.net/11449/31743
dc.identifier.wosWOS:000238633700036
dc.language.isoeng
dc.publisherElsevier B.V.
dc.relation.ispartofJournal of Solid State Chemistry
dc.relation.ispartofjcr2.179
dc.relation.ispartofsjr0,632
dc.rights.accessRightsAcesso restrito
dc.sourceWeb of Science
dc.subjectthin filmspt
dc.subjectchemical synthesispt
dc.subjectferroelectricitypt
dc.titleControl of retention and fatigue-free characteristics in CaBi4Ti4O15 thin films prepared by chemical methoden
dc.typeArtigo
dcterms.licensehttp://www.elsevier.com/about/open-access/open-access-policies/article-posting-policy
dcterms.rightsHolderElsevier B.V.
dspace.entity.typePublication
unesp.author.lattes3573363486614904[1]
unesp.author.lattes0173401604473200[4]
unesp.author.orcid0000-0003-2535-2187[1]
unesp.author.orcid0000-0003-2192-5312[4]
unesp.campusUniversidade Estadual Paulista (UNESP), Instituto de Química, Araraquarapt
unesp.departmentBioquímica e Tecnologia - IQARpt
unesp.departmentFísico-Química - IQARpt

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