Publicação: Soft chemical deposition of BiFeO3 multiferroic thin films
dc.contributor.author | Gonzalez, A. H. M. | |
dc.contributor.author | Simoes, A. Z. | |
dc.contributor.author | Cavalcante, L. S. | |
dc.contributor.author | Longo, Elson [UNESP] | |
dc.contributor.author | Varela, José Arana [UNESP] | |
dc.contributor.author | Riccardi, C. S. | |
dc.contributor.institution | Universidade Estadual Paulista (Unesp) | |
dc.contributor.institution | Georgia Inst Technol | |
dc.date.accessioned | 2014-05-20T15:21:03Z | |
dc.date.available | 2014-05-20T15:21:03Z | |
dc.date.issued | 2007-01-29 | |
dc.description.abstract | BiFeO3 thin films free of secondary phases were obtained by the soft chemical solution on Pt(111)/Ti/SiO2/Si substrates after annealing at 500 degrees C for 2 h. The film grown in the (100) direction presented a remanent polarization P-r of 31 mu C/cm(2) at room temperature. Electrical measurements using both quasistatic hysteresis and pulsed polarization confirm the existence of ferroelectricity with a switched polarization of 60-70 mu C/cm(2), Delta P=(P-*-P). Low leakage conduction and an out-of-plane piezoelectric (d(3)) coefficient of 40 pm/V were obtained by the improvement of preparation technology. | en |
dc.description.affiliation | Univ Estadual Paulista, Dept Quim, Fac Ciências, BR-17033360 São Paulo, Brazil | |
dc.description.affiliation | Univ Estadual Paulista, Inst Quim, Lab Interdisciplinar Ceram, BR-14801907 São Paulo, Brazil | |
dc.description.affiliation | Georgia Inst Technol, Sch Chem & Biochem, Atlanta, GA 30332 USA | |
dc.description.affiliationUnesp | Univ Estadual Paulista, Dept Quim, Fac Ciências, BR-17033360 São Paulo, Brazil | |
dc.description.affiliationUnesp | Univ Estadual Paulista, Inst Quim, Lab Interdisciplinar Ceram, BR-14801907 São Paulo, Brazil | |
dc.format.extent | 3 | |
dc.identifier | http://dx.doi.org/10.1063/1.2433027 | |
dc.identifier.citation | Applied Physics Letters. Melville: Amer Inst Physics, v. 90, n. 5, 3 p., 2007. | |
dc.identifier.doi | 10.1063/1.2433027 | |
dc.identifier.file | WOS000243977300068.pdf | |
dc.identifier.issn | 0003-6951 | |
dc.identifier.uri | http://hdl.handle.net/11449/32231 | |
dc.identifier.wos | WOS:000243977300068 | |
dc.language.iso | eng | |
dc.publisher | American Institute of Physics (AIP) | |
dc.relation.ispartof | Applied Physics Letters | |
dc.relation.ispartofjcr | 3.495 | |
dc.relation.ispartofsjr | 1,382 | |
dc.rights.accessRights | Acesso aberto | |
dc.source | Web of Science | |
dc.title | Soft chemical deposition of BiFeO3 multiferroic thin films | en |
dc.type | Artigo | |
dcterms.license | http://publishing.aip.org/authors/web-posting-guidelines | |
dcterms.rightsHolder | Amer Inst Physics | |
dspace.entity.type | Publication | |
unesp.author.lattes | 3573363486614904[1] | |
unesp.author.lattes | 0173401604473200[6] | |
unesp.author.orcid | 0000-0003-2535-2187[1] | |
unesp.author.orcid | 0000-0003-2192-5312[6] | |
unesp.campus | Universidade Estadual Paulista (UNESP), Instituto de Química, Araraquara | pt |
unesp.department | Bioquímica e Tecnologia - IQAR | pt |
unesp.department | Físico-Química - IQAR | pt |
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