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Ferroelectric characteristics of SrBi4Ti4O15 thin films grown on Pt/Ti/SiO2/Si substrates by the soft chemical method

dc.contributor.authorSimoes, A. Z.
dc.contributor.authorRamirez, M. A.
dc.contributor.authorRiccardi, C. S.
dc.contributor.authorLongo, Elson [UNESP]
dc.contributor.authorVarela, José Arana [UNESP]
dc.contributor.institutionUniversidade Estadual Paulista (Unesp)
dc.date.accessioned2014-05-20T14:17:59Z
dc.date.available2014-05-20T14:17:59Z
dc.date.issued2006-07-01
dc.description.abstractFerroelectric SrBi4Ti4O15 thin films were successfully prepared on a Pt(111)/Ti/SiO2/Si(100) substrate for the first time by spin coating, using the polymeric precursor method. X-ray diffraction patterns of the films indicate that they are polycrystalline in nature. Atomic force microscopy (AFM) analyses showed that the surface of these films is smooth, dense and crack-free with low surface roughness (6.4 nm). At room temperature and at a frequency of 1 MHz, the dielectric constant and the dissipation factor were, respectively, 150 and 0.022. The C-V characteristics of perovskite thin film prepared at low temperature show normal ferrolectric behaviour. The remanent polarization and coercive field for the films deposited were 5.4 mu C/cm(2) and 8 5 kV/cm, respectively. All the capacitors showed good polarization fatigue characteristics at least up to 1 x 10(10) bipolar pulse cycles indicating that SrBi4Ti4O15 thin films can be a promising material for use in nonvolatile memories. (c) 2005 Elsevier B.V. All rights reserved.en
dc.description.affiliationUNESP, Inst Chem, Dept Chem Phys, BR-14801970 Araraquara, SP, Brazil
dc.description.affiliationUNESP, Mat Sci & Technol, BR-1703336 Bauru, SP, Brazil
dc.description.affiliationUnespUNESP, Inst Chem, Dept Chem Phys, BR-14801970 Araraquara, SP, Brazil
dc.description.affiliationUnespUNESP, Mat Sci & Technol, BR-1703336 Bauru, SP, Brazil
dc.format.extent2020-2023
dc.identifierhttp://dx.doi.org/10.1016/j.matlet.2005.12.071
dc.identifier.citationMaterials Letters. Amsterdam: Elsevier B.V., v. 60, n. 16, p. 2020-2023, 2006.
dc.identifier.dimensionspub.1026307982
dc.identifier.doi10.1016/j.matlet.2005.12.071
dc.identifier.issn0167-577X
dc.identifier.issn1873-4979
dc.identifier.orcid0000-0003-2535-2187
dc.identifier.orcid0000-0003-0415-2944
dc.identifier.orcid0000-0002-2681-1579
dc.identifier.orcid0000-0001-8062-7791
dc.identifier.urihttp://hdl.handle.net/11449/25403
dc.identifier.wosWOS:000237756600020
dc.language.isoeng
dc.publisherElsevier B.V.
dc.publisherElsevier
dc.relation.ispartofMaterials Letters
dc.relation.ispartofjcr2.687
dc.rights.accessRightsAcesso restritopt
dc.sourceWeb of Science
dc.sourceDimensions
dc.subjectthin filmspt
dc.subjectatomic force microscopypt
dc.subjectdielectric propertiespt
dc.subjectfatiguept
dc.titleFerroelectric characteristics of SrBi4Ti4O15 thin films grown on Pt/Ti/SiO2/Si substrates by the soft chemical methoden
dc.typeArtigopt
dcterms.licensehttp://www.elsevier.com/about/open-access/open-access-policies/article-posting-policy
dcterms.rightsHolderElsevier B.V.
dspace.entity.typePublication
relation.isOrgUnitOfPublicationbc74a1ce-4c4c-4dad-8378-83962d76c4fd
relation.isOrgUnitOfPublication.latestForDiscoverybc74a1ce-4c4c-4dad-8378-83962d76c4fd
unesp.author.lattes3573363486614904[1]
unesp.author.lattes0173401604473200[3]
unesp.author.orcid0000-0003-2535-2187[1]
unesp.author.orcid0000-0003-2192-5312[3]
unesp.campusUniversidade Estadual Paulista (UNESP), Instituto de Química, Araraquarapt
unesp.departmentFísico-Química - IQARpt

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