Nanohardness of a Ti thin film and its interface deposited by an electron beam on a 304 SS substrate
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The results of nanohardness measurements at a film surface and film-substrate interface are presented and discussed. An electron beam device was used to deposit a Ti film on a 304 stainless steel (304 SS) substrate. The diluted interface was obtained by thermal activated atomic diffusion. The Ti film and Ti film-304 SS interface were analyzed by energy dispersive spectrometry and were observed using atomic force microscopy. The nanohardness of the Ti film-304 SS system was measured by a nanoindentation technique. The results showed the Ti film-304 SS interface had a higher hardness value than the Ti film and 304 SS substrate. The Ti film surface had a lower hardness due to the presence of a TiO2 thin layer.
How to cite this document
Vieira, R. A.; Nono, M. C.A.; Cruz, N. C.. Nanohardness of a Ti thin film and its interface deposited by an electron beam on a 304 SS substrate. Physica Status Solidi (B) Basic Research, v. 232, n. 1, p. 116-120, 2002. Available at: <http://hdl.handle.net/11449/224251>.