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dc.contributor.authorKodaira, F. V. P. [UNESP]
dc.contributor.authorMota, Rogério Pinto [UNESP]
dc.contributor.authorHills, V. A. [UNESP]
dc.contributor.authorHonda, Roberto Yzumi [UNESP]
dc.contributor.authorKayama, M. E. [UNESP]
dc.contributor.authorKostov, K. G. [UNESP]
dc.contributor.authorAlgatti, M. A. [UNESP]
dc.date.accessioned2014-05-20T13:27:43Z
dc.date.available2014-05-20T13:27:43Z
dc.date.issued2012-01-01
dc.identifierhttp://dx.doi.org/10.1088/1742-6596/370/1/012028
dc.identifier.citation14th Latin American Workshop on Plasma Physics (lawpp 2011). Bristol: Iop Publishing Ltd, v. 370, p. 7, 2012.
dc.identifier.issn1742-6588
dc.identifier.urihttp://hdl.handle.net/11449/9175
dc.description.abstractIn this work, it was used a plasma system composed of a cylindrical stainless steel reactor, a radio-frequency (13.56MHz) power source fixed at either 25 W or 70 W, a power source with a negative bias of 10kV and a 100Hz pulse. The system worked at an operational pressure of 80mTorr which consisted of varying concentrations of the monomer HMDSN and gaseous nitrogen in ratios: HMDSN (mTorr)/nitrogen (mTorr) from 70/10 to 20/60 in terms of operational pressure. The structural characterization of the films was done by FTIR spectroscopy. Absorptions were observed between 3500 cm(-1) to 3200 cm(-1), 3000 cm(-1) to 2900 cm(-1), 2500 cm(-1) to 2000 cm(-1), 1500 cm(-1) to 700 cm(-1), corresponding, respectively, to OH radicals, C-H stretching bonds in CH2 and CH3 molecules, C-N bonds, and finally, strain C-H bonds, Si-CH3 and Si-N groups, for both the 70 W and the 25 W. The contact angle for water was approximately 100 degrees and the surface energy is near 25mJ/m(2) which represents a hydrophobic surface, measured by goniometric method. The aging of the film was also analyzed by measuring the contact angle over a period of time. The stabilization was observed after 4 weeks. The refractive index of these materials presents values from 1.73 to 1.65 measured by ultraviolet-visible technique.en
dc.format.extent7
dc.language.isoeng
dc.publisherIop Publishing Ltd
dc.relation.ispartof14th Latin American Workshop on Plasma Physics (lawpp 2011)
dc.sourceWeb of Science
dc.titleThin films generated by plasma immersion ion implantation and deposition of hexamethyldisilazane mixed with nitrogen in different proportionsen
dc.typeTrabalho apresentado em evento
dcterms.licensehttp://iopscience.iop.org/1367-2630/page/NJP%20copyright%20statement
dcterms.licensehttp://iopscience.iop.org/1367-2630/page/NJP%20copyright%20statement
dcterms.rightsHolderIop Publishing Ltd
dc.contributor.institutionUniversidade Estadual Paulista (UNESP)
dc.description.affiliationUNESP, BR-12516410 Guaratingueta, SP, Brazil
dc.description.affiliationUnespUNESP, BR-12516410 Guaratingueta, SP, Brazil
dc.identifier.doi10.1088/1742-6596/370/1/012028
dc.identifier.wosWOS:000307752700028
dc.rights.accessRightsAcesso aberto
unesp.campusUniversidade Estadual Paulista (UNESP), Faculdade de Engenharia, Guaratinguetápt
dc.identifier.fileWOS000307752700028.pdf
dc.identifier.lattes0406258050385008
dc.identifier.lattes0400554449253191
dc.identifier.lattes1946509801000450
dc.identifier.lattes9585258374949244
unesp.author.lattes0406258050385008
unesp.author.lattes0400554449253191
unesp.author.lattes1946509801000450
unesp.author.lattes9585258374949244
dc.relation.ispartofsjr0,241
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