Plasma polymerized hexamethyldisiloxane: Discharge and film studies

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dc.contributor.authorDurrant, S. F.
dc.contributor.authorMota, Rogério Pinto [UNESP]
dc.contributor.authordeMoraes, WAB
dc.contributor.institutionUniversidade Estadual Paulista (Unesp)
dc.date.accessioned2014-05-20T15:27:58Z
dc.date.available2014-05-20T15:27:58Z
dc.date.issued1996-02-01
dc.description.abstractFilms were grown in hexamethyldisiloxane (HMDS)-argon mixtures in a diode sputtering system with a gold cathode. Quantitative optical emission spectroscopy (OES)-actinometry revealed that the electron density or mean electron energy (or both) increased with increasing Ar concentrations in the gas feed. Increasing concentrations of Ar produced greater sputtering of the cathode and hence greater plasma A u concentrations. Fragmentation of the HMDS molecule resulted in species such as CH, Fl, and Si which were detected by OES. Film deposition rate, as determined by optical interferometry, was found to be increased by the inclusion of Ar in the gas feed. Transmission electron microscopy revealed particles, probably of Au, embedded in the polymer films. Actinometric measurements of Au in the discharge and electron probe microscopy of the deposited material showed that film Au concentrations increase with increasing concentrations of Au in the plasma. A relatively low fragmentation of HMDS molecules in the de plasma was revealed by the very small Si-HIR absorption band which is usually prominent in spectra of plasma polymerized HMDS films.en
dc.description.affiliationUNIV ESTADUAL PAULISTA,FEG,DEPT FIS & QUIM,BR-12500 GUARANTINGUETA,SP,BRAZIL
dc.description.affiliationUnespUNIV ESTADUAL PAULISTA,FEG,DEPT FIS & QUIM,BR-12500 GUARANTINGUETA,SP,BRAZIL
dc.format.extent187-192
dc.identifierhttp://dx.doi.org/10.1016/0042-207X(95)00205-7
dc.identifier.citationVacuum. Oxford: Pergamon-Elsevier B.V., v. 47, n. 2, p. 187-192, 1996.
dc.identifier.doi10.1016/0042-207X(95)00205-7
dc.identifier.issn0042-207X
dc.identifier.orcid0000-0002-4511-3768
dc.identifier.urihttp://hdl.handle.net/11449/37877
dc.identifier.wosWOS:A1996TU56800016
dc.language.isoeng
dc.publisherElsevier B.V.
dc.relation.ispartofVacuum
dc.relation.ispartofjcr2.067
dc.rights.accessRightsAcesso restrito
dc.sourceWeb of Science
dc.titlePlasma polymerized hexamethyldisiloxane: Discharge and film studiesen
dc.typeArtigo
dcterms.licensehttp://www.elsevier.com/about/open-access/open-access-policies/article-posting-policy
dcterms.rightsHolderElsevier B.V.
unesp.author.orcid0000-0002-4511-3768[1]
unesp.campusUniversidade Estadual Paulista (Unesp), Faculdade de Engenharia, Guaratinguetápt
unesp.departmentFísica e Química - FEGpt

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Guaratinguetá - FEG - Faculdade de Engenharia e Ciências