The influence of oxygen in the photoexpansion of GaGeS glasses

dc.contributor.authorMessaddeq, S. H.
dc.contributor.authorMastelaro, V. R.
dc.contributor.authorLi, M. S.
dc.contributor.authorTabackniks, M.
dc.contributor.authorLezal, D.
dc.contributor.authorRamos, A.
dc.contributor.authorMessaddeq, Younes [UNESP]
dc.contributor.institutionUniversidade de São Paulo (USP)
dc.contributor.institutionAcad Sci Czech Republ
dc.contributor.institutionICT
dc.contributor.institutionLNLS
dc.contributor.institutionUniversidade Estadual Paulista (Unesp)
dc.date.accessioned2014-05-20T15:27:04Z
dc.date.available2014-05-20T15:27:04Z
dc.date.issued2003-01-31
dc.description.abstractIrreversible photoexpansion and photobleaching effect has been observed in amorphous Ga10Ge25S65 glass when its surface was exposed to light with energy greater than the band gap, 3.52 eV. The magnitude of the expansion of GaGeS glasses depends on the exposure conditions. Extended X-ray absorption fine structure (EXAFS) spectroscopy and Rutherford backscattering spectrometry (RBS) have been used to identify the chemical nature of the glass samples before and after illumination. The quantitative analysis of the EXAFS data leads to a two-shell model of 0.5 oxygen atoms at 2.01 Angstrom and 3.6 sulfur atoms at a 2.20 Angstrom. RBS technique demonstrated that chemical composition of the glass surface after irradiation is oxygen rich. The existence of Ge-O bonds in the glass after illumination was also confirmed by infrared measurements. (C) 2002 Elsevier B.V. B.V. All rights reserved.en
dc.description.affiliationUniv São Paulo, Inst Fis Sao Carlos, BR-13560970 Sao Carlos, SP, Brazil
dc.description.affiliationUniv São Paulo, Inst Fis, BR-05315 São Paulo, Brazil
dc.description.affiliationAcad Sci Czech Republ, Lab Inorgan Mat IIC, Prague 6, Czech Republic
dc.description.affiliationICT, Prague 6, Czech Republic
dc.description.affiliationLNLS, Campinas, SP, Brazil
dc.description.affiliationUNESP, Inst Quim, BR-14801970 Araraquara, SP, Brazil
dc.description.affiliationUnespUNESP, Inst Quim, BR-14801970 Araraquara, SP, Brazil
dc.format.extent143-150
dc.identifierhttp://dx.doi.org/10.1016/S0169-4332(02)01013-9
dc.identifier.citationApplied Surface Science. Amsterdam: Elsevier B.V., v. 205, n. 1-4, p. 143-150, 2003.
dc.identifier.doi10.1016/S0169-4332(02)01013-9
dc.identifier.issn0169-4332
dc.identifier.lattes2998503841917815
dc.identifier.urihttp://hdl.handle.net/11449/37117
dc.identifier.wosWOS:000180675100018
dc.language.isoeng
dc.publisherElsevier B.V.
dc.relation.ispartofApplied Surface Science
dc.relation.ispartofjcr4.439
dc.relation.ispartofsjr1,093
dc.rights.accessRightsAcesso restrito
dc.sourceWeb of Science
dc.subjectchalcogenide glassespt
dc.subjectphotoexpansionpt
dc.subjectoxygenpt
dc.subjectEXAFSpt
dc.subjectRBSpt
dc.titleThe influence of oxygen in the photoexpansion of GaGeS glassesen
dc.typeArtigo
dcterms.licensehttp://www.elsevier.com/about/open-access/open-access-policies/article-posting-policy
dcterms.rightsHolderElsevier B.V.
unesp.author.lattes2998503841917815
unesp.campusUniversidade Estadual Paulista (Unesp), Instituto de Química, Araraquarapt

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