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Anomalous temperature behavior of resistance in C1-xCox thin films grown by pulsed laser deposition technique

dc.contributor.authorSergeenkov, S.
dc.contributor.authorCórdova, C.
dc.contributor.authorCichetto, L. [UNESP]
dc.contributor.authorDe Lima, O. F.
dc.contributor.authorLongo, E. [UNESP]
dc.contributor.authorAraújo-Moreira, F. M.
dc.contributor.institutionUniversidade Federal da Paraíba (UFPB)
dc.contributor.institutionUniversidade Federal de Sã O Carlos
dc.contributor.institutionUniversidade Federal de São Carlos (UFSCar)
dc.contributor.institutionUniversidade Estadual Paulista (Unesp)
dc.contributor.institutionUniversidade Estadual de Campinas (UNICAMP)
dc.date.accessioned2018-12-11T17:26:57Z
dc.date.available2018-12-11T17:26:57Z
dc.date.issued2016-05-15
dc.description.abstractWe study the transport properties of C1-xCox thin films (with x = 0.1, 0.15 and 0.2) grown on Si substrate by pulsed laser deposition technique. The results demonstrate some anomalous effects in the behavior of the measured resistance R(T,x). More specifically, for 0 < T < T∗ range (with T∗ ≃ 220 K), the resistance is shown to be well fitted by a small polaron hopping scenario with Rh(T,x)∝exp(Formula presented.) and a characteristic temperature T0(x)≃T0(0)(1-x) (with T0(0) = 120 K). While for higher temperatures T∗ < T < TC(x), the resistance is found to be linearly dependent on spontaneous magnetization M(T,x), viz. RM(T,x)∝M(T,x), following the pattern dictated by electron scattering on cobalt atoms formed robust ferromagnetic structure with the Curie temperature TC(x) obeying a percolation like law TC(x)≃TC(xm)(x/xm)0.15 with TC(xm) = 295 K and the maximum zero-temperature magnetization reaching M(0,xm)≃0.5μB per Co atom for xm = 0.2.en
dc.description.affiliationDepartment of Physics CCEN Universidade Federal da Paraíba
dc.description.affiliationDepartment of Physics Universidade Federal de Sã O Carlos
dc.description.affiliationLIEC Department of Chemistry Universidade Federal de São Carlos
dc.description.affiliationInstitute of Chemistry Universidade Estadual Paulista - Unesp
dc.description.affiliationInstitute of Physics Gleb Wataghin UNICAMP
dc.description.affiliationUnespInstitute of Chemistry Universidade Estadual Paulista - Unesp
dc.description.sponsorshipFundação de Amparo à Pesquisa do Estado de São Paulo (FAPESP)
dc.description.sponsorshipIdFAPESP: 2013/07296-2
dc.description.sponsorshipIdFAPESP: 2014/01371-5
dc.format.extent18-22
dc.identifierhttp://dx.doi.org/10.1016/j.jallcom.2016.01.141
dc.identifier.citationJournal of Alloys and Compounds, v. 667, p. 18-22.
dc.identifier.doi10.1016/j.jallcom.2016.01.141
dc.identifier.file2-s2.0-84956680136.pdf
dc.identifier.issn0925-8388
dc.identifier.scopus2-s2.0-84956680136
dc.identifier.urihttp://hdl.handle.net/11449/177758
dc.language.isoeng
dc.relation.ispartofJournal of Alloys and Compounds
dc.relation.ispartofsjr1,020
dc.rights.accessRightsAcesso aberto
dc.sourceScopus
dc.subjectCarbon-cobalt nanocomposite
dc.subjectMagnetic scattering
dc.subjectPolaron hopping
dc.subjectResistance
dc.subjectThin films
dc.titleAnomalous temperature behavior of resistance in C1-xCox thin films grown by pulsed laser deposition techniqueen
dc.typeArtigo
unesp.author.orcid0000-0001-8080-2940[1]
unesp.campusUniversidade Estadual Paulista (Unesp), Instituto de Química, Araraquarapt
unesp.departmentBioquímica e Tecnologia - IQpt

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