Thermal decomposition of vanadyl Schiff-base compounds

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dc.contributor.authorDavid, H. L. [UNESP]
dc.contributor.authorLonashiro, M. [UNESP]
dc.contributor.authorBenedetti, Assis Vicente [UNESP]
dc.contributor.authorZamian, J. R.
dc.contributor.authorDockal, E. R.
dc.contributor.institutionUniversidade Estadual Paulista (Unesp)
dc.contributor.institutionUniversidade Federal de São Carlos (UFSCar)
dc.date.accessioned2014-05-27T11:17:28Z
dc.date.available2014-05-27T11:17:28Z
dc.date.issued1992-06-19
dc.description.abstractThe thermal stability and thermal decomposition of several Schiff bases coordinated to vanadyl, VO (Schiff base), were studied by thermogravimetry and conventional gas Chromatographic and X-ray analyses. The kinetics, the number of steps and, in particular, the final temperature of decomposition of these complexes depend on the equatorial ligand. © 1992.en
dc.description.affiliationInstituto de Química UNESP, Caixa Postal 355, Araraquara, SP
dc.description.affiliationDepartamento de Química Universidade Federal de São Carlos, Caixa Postal 676, São Carlos, SP
dc.description.affiliationUnespInstituto de Química UNESP, Caixa Postal 355, Araraquara, SP
dc.format.extent45-50
dc.identifierhttp://dx.doi.org/10.1016/0040-6031(92)85148-O
dc.identifier.citationThermochimica Acta, v. 202, n. C, p. 45-50, 1992.
dc.identifier.doi10.1016/0040-6031(92)85148-O
dc.identifier.issn0040-6031
dc.identifier.scopus2-s2.0-0040829299
dc.identifier.urihttp://hdl.handle.net/11449/64240
dc.language.isoeng
dc.relation.ispartofThermochimica Acta
dc.relation.ispartofjcr2.189
dc.relation.ispartofsjr0,605
dc.rights.accessRightsAcesso restrito
dc.sourceScopus
dc.titleThermal decomposition of vanadyl Schiff-base compoundsen
dc.typeArtigo
dcterms.licensehttp://www.elsevier.com/about/open-access/open-access-policies/article-posting-policy
unesp.author.lattes1769008264876945[3]
unesp.author.orcid0000-0002-0243-6639[3]
unesp.campusUniversidade Estadual Paulista (Unesp), Instituto de Química, Araraquarapt

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