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Publicação:
Atmospheric Pressure Plasma Chemical Vapor Deposition of Carvacrol Thin Films on Stainless Steel to Reduce the Formation ofE. ColiandS. AureusBiofilms

dc.contributor.authorGetnet, Tsegaye Gashaw [UNESP]
dc.contributor.authorSilva, Gabriela F. da
dc.contributor.authorDuarte, Iolanda S.
dc.contributor.authorKayama, Milton E. [UNESP]
dc.contributor.authorRangel, Elidiane C. [UNESP]
dc.contributor.authorCruz, Nilson C. [UNESP]
dc.contributor.institutionUniversidade Estadual Paulista (Unesp)
dc.contributor.institutionBahir Dar Univ
dc.contributor.institutionUniversidade Federal de São Carlos (UFSCar)
dc.date.accessioned2020-12-11T23:14:08Z
dc.date.available2020-12-11T23:14:08Z
dc.date.issued2020-07-01
dc.description.abstractIn this paper, we have investigated the deposition of thin films from natural carvacrol extract using dielectric barrier discharge (DBD) plasma polymerization, aiming at the inhibition of bacteria adhesion and proliferation. The films deposited on stainless steel samples have been characterized by scanning electron microscopy, infrared reflectance-absorbance spectroscopy, profilometry, and contact angle measurements. Films with thicknesses ranging from 1.5 mu m to 3.5 mu m presented a chemical structure similar to that of carvacrol. While the formation of biofilm was observed on untreated samples, the coating completely inhibited the adhesion ofE. coliand reduced the adhesion ofS. aureusbiofilm in more than 90%.en
dc.description.affiliationSao Paulo State Univ, Lab Technol Plasmas, BR-18087180 Sorocaba, SP, Brazil
dc.description.affiliationBahir Dar Univ, Dept Chem, Bahir Dar 79, Ethiopia
dc.description.affiliationUniv Fed Sao Carlos, Lab Environm Microbiol, BR-18052780 Sorocaba, SP, Brazil
dc.description.affiliationSao Paulo State Univ, Lab Plasmas & Applicat, BR-12516410 Guaratingueta, SP, Brazil
dc.description.affiliationUnespSao Paulo State Univ, Lab Technol Plasmas, BR-18087180 Sorocaba, SP, Brazil
dc.description.affiliationUnespSao Paulo State Univ, Lab Plasmas & Applicat, BR-12516410 Guaratingueta, SP, Brazil
dc.description.sponsorshipConselho Nacional de Desenvolvimento Científico e Tecnológico (CNPq)
dc.description.sponsorshipFundação de Amparo à Pesquisa do Estado de São Paulo (FAPESP)
dc.description.sponsorshipIdFAPESP: 190896/2015-9
dc.description.sponsorshipIdFAPESP: 302992/2017-0
dc.format.extent11
dc.identifierhttp://dx.doi.org/10.3390/ma13143166
dc.identifier.citationMaterials. Basel: Mdpi, v. 13, n. 14, 11 p., 2020.
dc.identifier.doi10.3390/ma13143166
dc.identifier.urihttp://hdl.handle.net/11449/197882
dc.identifier.wosWOS:000558034400001
dc.language.isoeng
dc.publisherMdpi
dc.relation.ispartofMaterials
dc.sourceWeb of Science
dc.subjectdielectric barrier discharge
dc.subjectcarvacrol plasma polymerization
dc.subjectbiofilm inhibition
dc.titleAtmospheric Pressure Plasma Chemical Vapor Deposition of Carvacrol Thin Films on Stainless Steel to Reduce the Formation ofE. ColiandS. AureusBiofilmsen
dc.typeArtigo
dcterms.rightsHolderMdpi
dspace.entity.typePublication
unesp.author.orcid0000-0001-9031-4289[1]
unesp.campusUniversidade Estadual Paulista (UNESP), Instituto de Ciência e Tecnologia, Sorocabapt
unesp.departmentEngenharia de Controle e Automação - ICTSpt

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