Logotipo do repositório
 

Publicação:
A Novel Plasma Technique for Surface Treatment: The Plasma Expander

dc.contributor.authorRangel, Elidiane C. [UNESP]
dc.contributor.authorMachida, Munemasa
dc.contributor.authorDurrant, Steven F. [UNESP]
dc.contributor.authorCruz, Nilson C. [UNESP]
dc.contributor.institutionUniversidade Estadual Paulista (Unesp)
dc.contributor.institutionUniversidade Estadual de Campinas (UNICAMP)
dc.date.accessioned2014-05-20T15:31:01Z
dc.date.available2014-05-20T15:31:01Z
dc.date.issued2012-02-01
dc.description.abstractThis paper describes a new plasma treatment method: the plasma expander. In this approach, expanding shock waves are generated in a vacuum chamber by pulsed plasmas. Collisions of fast species in the waves modify the properties of solid surfaces exposed to the plasma. The degree of such modification is governed by the energy delivered by the plasma exposure. To confirm the efficacy of this approach, modifications induced in the properties of thin polymer films produced by plasma-enhanced chemical vapor deposition by exposure to nitrogen plasma shock waves were investigated. The films were prepared from benzene radio frequency plasmas and subsequently exposed to different quantities of nitrogen shock waves N-w. The effects of N-w on the wettability, molecular structure, and mechanical properties of the films were studied. Fourier transform infrared spectroscopy revealed that greater N-w resulted in the loss of C-H groups and the rupture of benzene aromatic rings observed in the structure of the as-deposited films. Furthermore, the contact angle strongly increased and the hardness, evaluated by nanoindentation, increased up to fourfold with the increase in the intensity of the treatment.en
dc.description.affiliationSão Paulo State Univ UNESP, Technol Plasmas Lab, BR-18087180 Sorocaba, Brazil
dc.description.affiliationUniv Estadual Campinas, Inst Phys Gleb Wataghin, Plasma Phys Lab, BR-13083970 Campinas, SP, Brazil
dc.description.affiliationUnespSão Paulo State Univ UNESP, Technol Plasmas Lab, BR-18087180 Sorocaba, Brazil
dc.description.sponsorshipFundação de Amparo à Pesquisa do Estado de São Paulo (FAPESP)
dc.description.sponsorshipConselho Nacional de Desenvolvimento Científico e Tecnológico (CNPq)
dc.format.extent492-496
dc.identifierhttp://dx.doi.org/10.1109/TPS.2011.2178272
dc.identifier.citationIEEE Transactions on Plasma Science. Piscataway: IEEE-Inst Electrical Electronics Engineers Inc, v. 40, n. 2, p. 492-496, 2012.
dc.identifier.doi10.1109/TPS.2011.2178272
dc.identifier.issn0093-3813
dc.identifier.orcid0000-0002-4511-3768
dc.identifier.urihttp://hdl.handle.net/11449/40277
dc.identifier.wosWOS:000300429800011
dc.language.isoeng
dc.publisherInstitute of Electrical and Electronics Engineers (IEEE)
dc.relation.ispartofIEEE Transactions on Plasma Science
dc.relation.ispartofjcr1.253
dc.relation.ispartofsjr0,522
dc.rights.accessRightsAcesso restrito
dc.sourceWeb of Science
dc.subjectPlasma-enhanced chemical vapor deposition (PECVD)en
dc.subjectplasma expanderen
dc.subjectplasma treatmenten
dc.subjectsurface treatmenten
dc.subjectthin filmsen
dc.titleA Novel Plasma Technique for Surface Treatment: The Plasma Expanderen
dc.typeArtigo
dcterms.licensehttp://www.ieee.org/publications_standards/publications/rights/rights_policies.html
dcterms.rightsHolderIEEE-Inst Electrical Electronics Engineers Inc
dspace.entity.typePublication
unesp.author.orcid0000-0002-4511-3768[3]
unesp.campusUniversidade Estadual Paulista (UNESP), Instituto de Ciência e Tecnologia, Sorocabapt
unesp.departmentEngenharia de Controle e Automação - ICTSpt

Arquivos

Licença do Pacote

Agora exibindo 1 - 2 de 2
Carregando...
Imagem de Miniatura
Nome:
license.txt
Tamanho:
1.71 KB
Formato:
Item-specific license agreed upon to submission
Descrição:
Carregando...
Imagem de Miniatura
Nome:
license.txt
Tamanho:
1.71 KB
Formato:
Item-specific license agreed upon to submission
Descrição: