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Ferroelectric characteristics of BiFeO3 thin films prepared via a simple chemical solution deposition

dc.contributor.authorSimoes, A. Z.
dc.contributor.authorGonzalez, A. H. M.
dc.contributor.authorCavalcante, L. S.
dc.contributor.authorRiccardi, C. S.
dc.contributor.authorLongo, Elson [UNESP]
dc.contributor.authorVarela, José Arana [UNESP]
dc.contributor.institutionUniversidade Estadual Paulista (Unesp)
dc.contributor.institutionUniversidade Federal de São Carlos (UFSCar)
dc.contributor.institutionGeorgia Inst Technol
dc.date.accessioned2014-05-20T15:28:44Z
dc.date.available2014-05-20T15:28:44Z
dc.date.issued2007-04-01
dc.description.abstractBiFeO3 (BFO) thin films were fabricated on Pt(111)/Ti/SiO2/Si substrates by using a polymeric precursor solution under appropriate crystallization conditions. The capacitance dependence on voltage is strongly nonlinear, confirming the ferroelectric properties of the films resulting from the domain switching. The leakage current density increases with annealing temperature. The polarization electric field curves could be obtained in BFO films annealed at 500 degrees C, free of secondary phases. X-ray photoelectron spectroscopy spectra of films annealed at 500 degrees C indicated that the oxidation state of Fe was purely 3+, demonstrating that our films possess stable chemical configurations. (c) 2007 American Institute of Physics.en
dc.description.affiliationUniv Estadual Paulista, Dept Quim, Fac Ciências, BR-19033360 São Paulo, Brazil
dc.description.affiliationUniv Fed Sao Carlos, Dept Quim, Lab Interdisciplinar Eletroquim & Ceram, BR-13565905 São Paulo, Brazil
dc.description.affiliationGeorgia Inst Technol, Sch Chem & Biochem, Atlanta, GA 30332 USA
dc.description.affiliationUnespUniv Estadual Paulista, Dept Quim, Fac Ciências, BR-19033360 São Paulo, Brazil
dc.format.extent6
dc.identifierhttp://dx.doi.org/10.1063/1.2715513
dc.identifier.citationJournal of Applied Physics. Melville: Amer Inst Physics, v. 101, n. 7, 6 p., 2007.
dc.identifier.doi10.1063/1.2715513
dc.identifier.fileWOS000245691000070.pdf
dc.identifier.issn0021-8979
dc.identifier.urihttp://hdl.handle.net/11449/38498
dc.identifier.wosWOS:000245691000070
dc.language.isoeng
dc.publisherAmerican Institute of Physics (AIP)
dc.relation.ispartofJournal of Applied Physics
dc.relation.ispartofjcr2.176
dc.relation.ispartofsjr0,739
dc.rights.accessRightsAcesso aberto
dc.sourceWeb of Science
dc.titleFerroelectric characteristics of BiFeO3 thin films prepared via a simple chemical solution depositionen
dc.typeArtigo
dcterms.licensehttp://publishing.aip.org/authors/web-posting-guidelines
dcterms.rightsHolderAmer Inst Physics
dspace.entity.typePublication
unesp.author.lattes3573363486614904[1]
unesp.author.lattes0173401604473200[4]
unesp.author.orcid0000-0003-2535-2187[1]
unesp.author.orcid0000-0003-2192-5312[4]
unesp.campusUniversidade Estadual Paulista (UNESP), Instituto de Química, Araraquarapt
unesp.departmentBioquímica e Tecnologia - IQARpt
unesp.departmentFísico-Química - IQARpt

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