Publicação: Effect of oxidizing atmosphere on ferroelectric and piezoelectric response of CaBi2Nb2O9 thin films
dc.contributor.author | Simões, Alexandre Zirpoli [UNESP] | |
dc.contributor.author | Aguiar, E. C. [UNESP] | |
dc.contributor.author | Riccardi, C. S. [UNESP] | |
dc.contributor.author | Longo, Elson [UNESP] | |
dc.contributor.author | Varela, José Arana [UNESP] | |
dc.contributor.author | Mizaikoff, B. | |
dc.contributor.institution | Universidade Estadual Paulista (Unesp) | |
dc.contributor.institution | Georgia Inst Technol | |
dc.contributor.institution | Universidade Federal de Itajubá (UNIFEI) | |
dc.date.accessioned | 2014-05-20T14:18:46Z | |
dc.date.available | 2014-05-20T14:18:46Z | |
dc.date.issued | 2010-12-01 | |
dc.description.abstract | Calcium bismuth niobate (CaBi2Nb2O9 CBNO) thin films were evaluated for use as lead-free piezoelectric in micro-electromechanical systems The films were grown by the polymeric precursor method on Pt/Ti/SiO2/Si (1 0 0) (Pt) substrates and annealed at 700 C for 2 h in ambient and oxygen atmospheric conditions The films were characterized by means of XRD Raman IR PFM and electrical measurements Annealing in ambient condition leads to improved ferroelectric properties higher fatigue and retention resistances and improved piezoelectric response Furthermore oxygen atmosphere produces bismuth vacancies (V-Bi,) that inhibit the movement of domain walls along the z-axis and consequently reduces the piezoelectric coefficient Independently of the applied electric field the retained switchable polarization approached a nearly steady-state value after a retention time of 10 s (c) 2010 Elsevier B V All rights reserved | en |
dc.description.affiliation | UNESP, Dept Chem Phys, Inst Chem, BR-14800900 Araraquara, SP, Brazil | |
dc.description.affiliation | Georgia Inst Technol, Sch Chem & Biochem, Atlanta, GA 30332 USA | |
dc.description.affiliation | Fed Univ Itajuba Unifei, BR-3590037 Itabira, MG, Brazil | |
dc.description.affiliationUnesp | UNESP, Dept Chem Phys, Inst Chem, BR-14800900 Araraquara, SP, Brazil | |
dc.description.sponsorship | Fundação de Amparo à Pesquisa do Estado de São Paulo (FAPESP) | |
dc.description.sponsorship | Conselho Nacional de Desenvolvimento Científico e Tecnológico (CNPq) | |
dc.description.sponsorship | Coordenação de Aperfeiçoamento de Pessoal de Nível Superior (CAPES) | |
dc.format.extent | 894-899 | |
dc.identifier | http://dx.doi.org/10.1016/j.matchemphys.2010.08.059 | |
dc.identifier.citation | Materials Chemistry and Physics. Lausanne: Elsevier B.V. Sa, v. 124, n. 2-3, p. 894-899, 2010. | |
dc.identifier.doi | 10.1016/j.matchemphys.2010.08.059 | |
dc.identifier.issn | 0254-0584 | |
dc.identifier.uri | http://hdl.handle.net/11449/25667 | |
dc.identifier.wos | WOS:000284434100002 | |
dc.language.iso | eng | |
dc.publisher | Elsevier B.V. Sa | |
dc.relation.ispartof | Materials Chemistry and Physics | |
dc.relation.ispartofjcr | 2.210 | |
dc.relation.ispartofsjr | 0,615 | |
dc.rights.accessRights | Acesso restrito | |
dc.source | Web of Science | |
dc.subject | Thin films | en |
dc.subject | Annealing | en |
dc.subject | Chemical synthesis | en |
dc.subject | Ferroelectricity | en |
dc.title | Effect of oxidizing atmosphere on ferroelectric and piezoelectric response of CaBi2Nb2O9 thin films | en |
dc.type | Artigo | |
dcterms.license | http://www.elsevier.com/about/open-access/open-access-policies/article-posting-policy | |
dcterms.rightsHolder | Elsevier B.V. Sa | |
dspace.entity.type | Publication | |
unesp.author.lattes | 0173401604473200[3] | |
unesp.author.orcid | 0000-0003-2192-5312[3] | |
unesp.campus | Universidade Estadual Paulista (UNESP), Instituto de Química, Araraquara | pt |
unesp.department | Físico-Química - IQAR | pt |
Arquivos
Licença do Pacote
1 - 2 de 2
Carregando...
- Nome:
- license.txt
- Tamanho:
- 1.71 KB
- Formato:
- Item-specific license agreed upon to submission
- Descrição:
Carregando...
- Nome:
- license.txt
- Tamanho:
- 1.71 KB
- Formato:
- Item-specific license agreed upon to submission
- Descrição: