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Structural, dielectric and ferroelectric properties of Nb-doped PZT thin films produced by oxide precursor method

dc.contributor.authorAraújo, E. B. [UNESP]
dc.contributor.authorEiras, J. A.
dc.contributor.institutionUniversidade Estadual Paulista (Unesp)
dc.contributor.institutionUniversidade Federal de São Carlos (UFSCar)
dc.date.accessioned2014-05-27T11:20:23Z
dc.date.available2014-05-27T11:20:23Z
dc.date.issued2002-01-01
dc.description.abstractRecently, was proposed a chemical method for preparation of ferroelectric thin films based on oxide precursors. In this work, PZT thin films were prepared to attest the viability of this method for cation-substitution. In this study, a small concentration of Nb (5 mol%) was selected as substitute of B-site in ABO 3 structure of PZT. Dielectric and ferroelectric properties of PZT films were studied as a function of cation-substitution. Results for Nb-PZT were compared with PZT films undoped. The values of dielectric constant, at typical 100 kHz frequency, were 358 and 137, for PZT and Nb-PZT films respectively. Remanent polarizations of these films were respectively 7.33 μ C/cm 2 and 13.3 μ C/cm 2 , while the measured coercive fields were 101 kV/cm and 93 kV/cm. As a result, changes on observed dielectric and ferroelectric values confirm the Nb substitution in PZT thin film produced by oxide precursor method. © 2002 Taylor & Francis.en
dc.description.affiliationUniversidade Estadual Paulista Departamento de Física e Química Grupo de Vidros e Cerâmicas, Caixa Postal 31, 15385-000 Ilha Solteira - SP
dc.description.affiliationUniversidade Federal de São Carlos Departamento de Física Grupo de Cerâmicas Ferroelétricas, Caixa Postal 676, 13565-670 São Carlos - SP
dc.description.affiliationUnespUniversidade Estadual Paulista Departamento de Física e Química Grupo de Vidros e Cerâmicas, Caixa Postal 31, 15385-000 Ilha Solteira - SP
dc.format.extent51-56
dc.identifierhttp://dx.doi.org/10.1080/713716104
dc.identifier.citationFerroelectrics, v. 270, p. 51-56.
dc.identifier.doi10.1080/00150190211254
dc.identifier.issn0015-0193
dc.identifier.issn1563-5112
dc.identifier.lattes6725982228402054
dc.identifier.scopus2-s2.0-33746290172
dc.identifier.urihttp://hdl.handle.net/11449/66760
dc.identifier.wosWOS:000176862200010
dc.language.isoeng
dc.relation.ispartofFerroelectrics
dc.relation.ispartofjcr0.728
dc.relation.ispartofsjr0,260
dc.rights.accessRightsAcesso aberto
dc.sourceScopus
dc.subjectFerroelectric
dc.subjectPZT
dc.subjectThin films
dc.subjectDielectric properties
dc.subjectFerroelectricity
dc.subjectLead compounds
dc.subjectPermittivity
dc.subjectPolarization
dc.subjectSubstitution reactions
dc.subjectCation-substitution
dc.subjectOxide precursor method
dc.subjectRemanent polarizations
dc.titleStructural, dielectric and ferroelectric properties of Nb-doped PZT thin films produced by oxide precursor methoden
dc.typeTrabalho apresentado em evento
dcterms.licensehttp://journalauthors.tandf.co.uk/permissions/reusingOwnWork.asp
dspace.entity.typePublication
unesp.author.lattes6725982228402054
unesp.campusUniversidade Estadual Paulista (UNESP), Faculdade de Engenharia, Ilha Solteirapt
unesp.departmentFísica e Química - FEISpt

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