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Study of the dielectric and ferroelectric properties of chemically processed BaxSr1-xTiO3 thin films

dc.contributor.authorPontes, F. M.
dc.contributor.authorLongo, Elson [UNESP]
dc.contributor.authorLeite, E. R.
dc.contributor.authorVarela, José Arana [UNESP]
dc.contributor.institutionUniversidade Federal de São Carlos (UFSCar)
dc.contributor.institutionUniversidade Estadual Paulista (Unesp)
dc.date.accessioned2014-05-20T15:19:49Z
dc.date.available2014-05-20T15:19:49Z
dc.date.issued2001-05-01
dc.description.abstractPolycrystalline BaxSr1-xTiO3 (x = 0.4 and 0.8) thin films with a perovskite structure were prepared by the polymeric precursor method on a platinum-coated silicon substrate. High-quality thin films with uniform composition and thickness were successfully produced by dip-coating and spin-coating techniques. The resulting thin films prepared by dip and spin-coating showed a well-developed dense polycrystalline structure with uniform grain size distribution. The metal-BST-metal structure of the thin films displays good dielectric and ferroelectric properties. The ferroelectric nature to BaxSr1-xTiO3 (x = 0.8) thin film, indicated by butterfly-shaped C-V curves and confirmed by the hysteresis curve, showed 2P(r) = 5.0 muC/cm(2) and E-c = 20 kV/cm. The capacitance-frequency curve reveals that the dielectric constant may reach a value of up to 794 at 1 kHz. on the other hand, the BaxSr1-xTiO3 (x = 0.4) thin films had paraelectric nature and dielectric constant and the dissipation factor at a frequency of 100 kHz were 680 and 0.01, respectively, for film annealed at 700 degreesC. In addition, an examination of the film's I-V curve at room temperature revealed the presence of two conduction regions in the BaxSr1-xTiO3 (x = 0.4 and 0.8) thin films, showing ohmic-like behavior at low voltage and a Schottky-emission or Poole-Frenkel mechanism at high voltage. (C) 2001 Elsevier B.V. B.V. All rights reserved.en
dc.description.affiliationUniv Fed Sao Carlos, Dept Chem, LIEC, BR-13560905 Sao Carlos, SP, Brazil
dc.description.affiliationPaulista State Univ, UNESP, Inst Chem, BR-14801907 Araraquara, SP, Brazil
dc.description.affiliationUnespPaulista State Univ, UNESP, Inst Chem, BR-14801907 Araraquara, SP, Brazil
dc.format.extent91-98
dc.identifierhttp://dx.doi.org/10.1016/S0040-6090(01)00781-7
dc.identifier.citationThin Solid Films. Lausanne: Elsevier B.V. Sa, v. 386, n. 1, p. 91-98, 2001.
dc.identifier.doi10.1016/S0040-6090(01)00781-7
dc.identifier.issn0040-6090
dc.identifier.urihttp://hdl.handle.net/11449/31209
dc.identifier.wosWOS:000167753700013
dc.language.isoeng
dc.publisherElsevier B.V.
dc.relation.ispartofThin Solid Films
dc.relation.ispartofjcr1.939
dc.relation.ispartofsjr0,617
dc.rights.accessRightsAcesso restrito
dc.sourceWeb of Science
dc.subjectdielectric and ferroelectric propertiespt
dc.subjectcapacitance-frequency curvept
dc.subjectSchottky-emissionpt
dc.subjectPoole-Frenkel mechanismpt
dc.titleStudy of the dielectric and ferroelectric properties of chemically processed BaxSr1-xTiO3 thin filmsen
dc.typeArtigo
dcterms.licensehttp://www.elsevier.com/about/open-access/open-access-policies/article-posting-policy
dcterms.rightsHolderElsevier B.V.
dspace.entity.typePublication
unesp.campusUniversidade Estadual Paulista (UNESP), Instituto de Química, Araraquarapt
unesp.departmentBioquímica e Tecnologia - IQARpt
unesp.departmentFísico-Química - IQARpt

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