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Structural characterization of undoped and Sb-doped SnO2 thin films fired at different temperatures

dc.contributor.authorRizzato, A. P.
dc.contributor.authorSantilli, Celso Valentim [UNESP]
dc.contributor.authorPulcinelli, Sandra Helena [UNESP]
dc.contributor.authorCraievich, A. F.
dc.contributor.institutionUniversidade Estadual Paulista (Unesp)
dc.contributor.institutionUniv Bourgogne
dc.contributor.institutionUniversidade de São Paulo (USP)
dc.date.accessioned2014-05-20T15:20:36Z
dc.date.available2014-05-20T15:20:36Z
dc.date.issued2003-06-01
dc.description.abstractSnO2 thin films were obtained by the sol-gel method starting from inorganic precursor solutions. In this work, we compare the structure of undoped and Sb-doped SnO2 films prepared by dip-coating. The films were deposited on quartz substrates and then fired at different temperatures ranging from 383 up to 1173 K. The density and the thickness of the films were determined by X-ray reflectivity (XRR) and their porous nanostructure was characterized by grazing-incidence small angle X-ray scattering (GISAXS). XRR results corresponding to undoped and Sb-doped samples indicate a monotonous decrease in film thickness when they are fired at increasing temperatures. At same time, the apparent density of undoped samples exhibits a progressive increase while for Sb-doped films it remains invariant up to 973 K and then increases for T = 1173 K. Anisotropic GISAXS patterns of both films, Sb-doped and undoped, fired above 573 K indicate the presence of elongated pores with their major axis perpendicular to the film surface. For all firing temperatures the nanopores in doped samples are larger than in undoped ones. This suggests that Sb-doping favours the pore growth hindering the film densification. At the highest firing temperature (1173 K) this effect is reversed.en
dc.description.affiliationUNESP, LQM, Inst Chem, Araraquara, SP, Brazil
dc.description.affiliationUniv Bourgogne, LRRS, Dijon, France
dc.description.affiliationUniv São Paulo, Inst Phys, BR-09500900 São Paulo, SP, Brazil
dc.description.affiliationUnespUNESP, LQM, Inst Chem, Araraquara, SP, Brazil
dc.format.extent736-739
dc.identifierhttp://dx.doi.org/10.1107/S0021889803004953
dc.identifier.citationJournal of Applied Crystallography. Copenhagen: Blackwell Munksgaard, v. 36, n. 1, p. 736-739, 2003.
dc.identifier.doi10.1107/S0021889803004953
dc.identifier.issn0021-8898
dc.identifier.lattes5584298681870865
dc.identifier.lattes9971202585286967
dc.identifier.orcid0000-0002-8356-8093
dc.identifier.urihttp://hdl.handle.net/11449/31868
dc.identifier.wosWOS:000182284400076
dc.language.isoeng
dc.publisherBlackwell Munksgaard
dc.relation.ispartofJournal of Applied Crystallography
dc.relation.ispartofsjr1,635
dc.rights.accessRightsAcesso restritopt
dc.sourceWeb of Science
dc.subjectSnO2 thin filmspt
dc.subjectSb-dopedpt
dc.subjectGISAXSpt
dc.subjectXRRpt
dc.titleStructural characterization of undoped and Sb-doped SnO2 thin films fired at different temperaturesen
dc.typeArtigopt
dcterms.licensehttp://olabout.wiley.com/WileyCDA/Section/id-406071.html
dcterms.rightsHolderBlackwell Munksgaard
dspace.entity.typePublication
relation.isOrgUnitOfPublicationbc74a1ce-4c4c-4dad-8378-83962d76c4fd
relation.isOrgUnitOfPublication.latestForDiscoverybc74a1ce-4c4c-4dad-8378-83962d76c4fd
unesp.author.lattes9971202585286967
unesp.author.lattes5584298681870865[2]
unesp.author.orcid0000-0002-8356-8093[2]
unesp.campusUniversidade Estadual Paulista (UNESP), Instituto de Química, Araraquarapt
unesp.departmentFísico-Química - IQARpt

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