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Improvement of fatigue resistance on La modified BiFeO(3) thin films

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dc.contributor.authorSimões, Alexandre Zirpoli [UNESP]
dc.contributor.authorCavalcante, L. S.
dc.contributor.authorRiccardi, C. S. [UNESP]
dc.contributor.authorVarela, José Arana [UNESP]
dc.contributor.authorLongo, Elson [UNESP]
dc.contributor.institutionUniversidade Federal de São Carlos (UFSCar)
dc.contributor.institutionUniversidade Estadual Paulista (Unesp)
dc.date.accessioned2014-05-20T14:18:30Z
dc.date.available2014-05-20T14:18:30Z
dc.date.issued2009-03-01
dc.description.abstractThe effect of lanthanum (La) addition in BiFeO(3) (BFO) thin films deposited on Pt(111)/Ti/SiO(2)/Si(100) substrates prepared by soft chemical method was explained. Increasing La concentration promotes changes on structure, microstructure and dielectric/ferroelectric response of films. X-ray diffraction reveals that the films are free of preferred orientations and structural distortion. La addition promotes an increase in dielectric permittivity. The polarization switching and the fatigue behavior of the BFO films were significantly enhanced by the La concentration. (C) 2008 Elsevier B.V. All rights reserved.en
dc.description.affiliationUniversidade Federal de São Carlos (UFSCar), Dept Quim, LIEC, BR-13565905 São Carlos, SP, Brazil
dc.description.affiliationUniv Estadual Paulista, Inst Quim, Dept Fisicoquim, Lab Interdisciplinar Ceram, BR-14801907 Araraquara, SP, Brazil
dc.description.affiliationUnespUniv Estadual Paulista, Inst Quim, Dept Fisicoquim, Lab Interdisciplinar Ceram, BR-14801907 Araraquara, SP, Brazil
dc.description.sponsorshipCoordenação de Aperfeiçoamento de Pessoal de Nível Superior (CAPES)
dc.description.sponsorshipFundação de Amparo à Pesquisa do Estado de São Paulo (FAPESP)
dc.description.sponsorshipConselho Nacional de Desenvolvimento Científico e Tecnológico (CNPq)
dc.format.extent520-523
dc.identifierhttp://dx.doi.org/10.1016/j.cap.2008.05.001
dc.identifier.citationCurrent Applied Physics. Amsterdam: Elsevier B.V., v. 9, n. 2, p. 520-523, 2009.
dc.identifier.doi10.1016/j.cap.2008.05.001
dc.identifier.issn1567-1739
dc.identifier.urihttp://hdl.handle.net/11449/25572
dc.identifier.wosWOS:000261360300041
dc.language.isoeng
dc.publisherElsevier B.V.
dc.relation.ispartofCurrent Applied Physics
dc.relation.ispartofjcr2.058
dc.relation.ispartofsjr0,647
dc.rights.accessRightsAcesso restrito
dc.sourceWeb of Science
dc.subjectFatigue resistanceen
dc.subjectBiFeO(3)en
dc.subjectFerroelectricen
dc.subjectMultiferroicen
dc.titleImprovement of fatigue resistance on La modified BiFeO(3) thin filmsen
dc.typeArtigo
dcterms.licensehttp://www.elsevier.com/about/open-access/open-access-policies/article-posting-policy
dcterms.rightsHolderElsevier B.V.
dspace.entity.typePublication
unesp.author.lattes0173401604473200[3]
unesp.author.orcid0000-0003-2192-5312[3]
unesp.campusUniversidade Estadual Paulista (UNESP), Instituto de Química, Araraquarapt
unesp.departmentFísico-Química - IQARpt

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Araraquara - IQAR - Instituto de Química