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Electrostatic force microscopy as a tool to estimate the number of active potential barriers in dense non-Ohmic polycrystalline SnO2 devices

dc.contributor.authorVasconcelos, J. S.
dc.contributor.authorVasconcelos, N. S. L. S.
dc.contributor.authorOrlandi, Marcelo Ornaghi [UNESP]
dc.contributor.authorBueno, Paulo Roberto [UNESP]
dc.contributor.authorVarela, José Arana [UNESP]
dc.contributor.authorLongo, Elson [UNESP]
dc.contributor.authorBarrado, C. M.
dc.contributor.authorLeite, E. R.
dc.contributor.institutionCentro Federal de Educação Tecnológica (CEFET)
dc.contributor.institutionUniversidade Estadual Paulista (Unesp)
dc.contributor.institutionUniversidade Federal de São Carlos (UFSCar)
dc.date.accessioned2014-05-20T15:29:52Z
dc.date.available2014-05-20T15:29:52Z
dc.date.issued2006-10-09
dc.description.abstractIn the present work, electroactive grain boundaries of highly dense metal oxide SnO2-based polycrystalline varistors were determined by electrostatic force microscopy (EFM). The EFM technique was applied to identify electroactive grain boundaries and thus estimate the amount of active grain boundary, which, in the metal oxide SnO2-based varistor, was calculated at around 85%, i.e., much higher than that found in traditional metal oxide ZnO-based varistors. The mean potential barrier height value obtained from the EFM analysis was in complete agreement with the values calculated from the C-V measurements, together with a complex capacitance plane analysis that validates the methodology proposed here. (c) 2006 American Institute of Physics.en
dc.description.affiliationCEFET, Ctr Fed Educ Tecnol Maranhao, BR-65025001 Maranhao, Brazil
dc.description.affiliationUniv Estadual Paulista, Dept Quim & Fis, BR-15385000 São Paulo, Brazil
dc.description.affiliationUniv Estadual Paulista, Inst Quim, BR-14800900 São Paulo, Brazil
dc.description.affiliationUniv Fed Sao Carlos, Dept Quim, BR-13565905 Sao Carlos, SP, Brazil
dc.description.affiliationUnespUniv Estadual Paulista, Dept Quim & Fis, BR-15385000 São Paulo, Brazil
dc.description.affiliationUnespUniv Estadual Paulista, Inst Quim, BR-14800900 São Paulo, Brazil
dc.format.extent3
dc.identifierhttp://dx.doi.org/10.1063/1.2354483
dc.identifier.citationApplied Physics Letters. Melville: Amer Inst Physics, v. 89, n. 15, 3 p., 2006.
dc.identifier.doi10.1063/1.2354483
dc.identifier.fileWOS000241247900051.pdf
dc.identifier.issn0003-6951
dc.identifier.lattes2305581567093057
dc.identifier.lattes0477045906733254
dc.identifier.orcid0000-0003-2827-0208
dc.identifier.urihttp://hdl.handle.net/11449/39345
dc.identifier.wosWOS:000241247900051
dc.language.isoeng
dc.publisherAmerican Institute of Physics (AIP)
dc.relation.ispartofApplied Physics Letters
dc.relation.ispartofjcr3.495
dc.relation.ispartofsjr1,382
dc.rights.accessRightsAcesso aberto
dc.sourceWeb of Science
dc.titleElectrostatic force microscopy as a tool to estimate the number of active potential barriers in dense non-Ohmic polycrystalline SnO2 devicesen
dc.typeArtigo
dcterms.licensehttp://publishing.aip.org/authors/web-posting-guidelines
dcterms.rightsHolderAmer Inst Physics
dspace.entity.typePublication
unesp.author.lattes2305581567093057
unesp.author.lattes0477045906733254[4]
unesp.author.orcid0000-0003-2827-0208[4]
unesp.campusUniversidade Estadual Paulista (UNESP), Instituto de Química, Araraquarapt
unesp.departmentBioquímica e Tecnologia - IQARpt
unesp.departmentFísico-Química - IQARpt

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