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Diffusion and interface controlled reactions in alpha-(Cu-Al-Ag) alloys

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dc.contributor.authorAdorno, A. T.
dc.contributor.authorSilva, R. A. G.
dc.contributor.authorMagdalena, A. G.
dc.contributor.institutionUniversidade Estadual Paulista (Unesp)
dc.date.accessioned2014-05-20T14:18:01Z
dc.date.available2014-05-20T14:18:01Z
dc.date.issued2007-08-30
dc.description.abstractThe isothermal kinetics of Ag precipitation was studied in Cu-Al-Ag alloys with concentrations ranging from 2 to 8 wt.%Al and 2 to 12 wt.%Ag, using scanning electron microscopy (SEM), X-ray energy dispersive spectroscopy (EDX) and microhardness measurements. The results indicated a change in the precipitates growing mechanism from diffusion to interface controlled process, probably due to a change in the nature of the interface with the Ag and Al enrichment of the precipitates. (C) 2006 Elsevier B.V. All rights reserved.en
dc.description.affiliationUNESP, Inst Quim, Dept Quim Fis, BR-14801 Araraquara, SP, Brazil
dc.description.affiliationUnespUNESP, Inst Quim, Dept Quim Fis, BR-14801 Araraquara, SP, Brazil
dc.format.extent119-123
dc.identifierhttp://dx.doi.org/10.1016/j.jallcom.2006.09.083
dc.identifier.citationJournal of Alloys and Compounds. Lausanne: Elsevier B.V. Sa, v. 441, n. 1-2, p. 119-123, 2007.
dc.identifier.doi10.1016/j.jallcom.2006.09.083
dc.identifier.issn0925-8388
dc.identifier.urihttp://hdl.handle.net/11449/25418
dc.identifier.wosWOS:000247991000025
dc.language.isoeng
dc.publisherElsevier B.V.
dc.relation.ispartofJournal of Alloys and Compounds
dc.relation.ispartofjcr3.779
dc.relation.ispartofsjr1,020
dc.rights.accessRightsAcesso restrito
dc.sourceWeb of Science
dc.subjectmetals and alloyspt
dc.subjectprecipitationpt
dc.subjectdiffusionpt
dc.subjectkineticspt
dc.titleDiffusion and interface controlled reactions in alpha-(Cu-Al-Ag) alloysen
dc.typeArtigo
dcterms.licensehttp://www.elsevier.com/about/open-access/open-access-policies/article-posting-policy
dcterms.rightsHolderElsevier B.V.
dspace.entity.typePublication
unesp.author.lattes9021023390828296[3]
unesp.author.orcid0000-0003-3385-2106[3]
unesp.campusUniversidade Estadual Paulista (UNESP), Instituto de Química, Araraquarapt
unesp.departmentFísico-Química - IQARpt

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Araraquara - IQAR - Instituto de Química