Structural and optical properties o plasma-deposited a-C:H:Si:O:N films
Carregando...
Fontes externas
Fontes externas
Data
Orientador
Coorientador
Pós-graduação
Curso de graduação
Título da Revista
ISSN da Revista
Título de Volume
Editor
FapUNIFESP (SciELO)
Tipo
Trabalho apresentado em evento
Direito de acesso
Acesso aberto
Fontes externas
Fontes externas
Resumo
Thin a-C:H:Si:O:N films were deposited from plasmas fed hexamethyldisiloxane, oxygen and nitrogen, and characterized as a function of the partial pressure of oxygen in the feed, Rox. Deposition rates varied from 10 to 27 nm min-1. Surface roughness was independent of Rox, being around 10 nm. The films contain C=C and C=O, and also Si-C and Si-O-Si groups. Lower [C] and [N] but greater [O] and [Si] were measured in the films as Rox was increased. Refractive indices of ~ 1.5 and optical energy gaps which fell from ~ 3.3 to ~2.3 eV were observed with increasing Rox. The Urbach energy fell with increasing optical gap, which is characteristic of amorphous materials. Such materials have potential as transparent barrier coatings.
Descrição
Palavras-chave
Idioma
Inglês
Citação
Polimeros, v. 31, n. 3, 2021.
