Publicação: Low voltage electroluminescence of terbium- and thulium-doped zinc oxide films
dc.contributor.author | Lima, SAM | |
dc.contributor.author | Davolos, Marian Rosaly [UNESP] | |
dc.contributor.author | Legnani, C. | |
dc.contributor.author | Quirino, W. G. | |
dc.contributor.author | Cremona, M. | |
dc.contributor.institution | Universidade Estadual Paulista (Unesp) | |
dc.contributor.institution | Pontifícia Universidade Católica do Rio de Janeiro (PUC-Rio) | |
dc.date.accessioned | 2014-05-20T15:30:14Z | |
dc.date.available | 2014-05-20T15:30:14Z | |
dc.date.issued | 2006-07-20 | |
dc.description.abstract | Strong interest in developing technology for visual information. stimulates research for thin film electroluminescent devices. Here, for the first time, we report that thulium- and terbium-doped zinc-oxide films are suitable for electroluminescence applications. Two different devices were assembled as lTO/LiF/ZnO:RE/LiF/Al or ITO/SiO2/ZnO:RE/SiO2/Al, where ZnO:RE is a film of zinc oxide containing 10 at% of Tb3+ or Tm3+. Electroluminescence spectra show that besides a broad emission band with maximum around 650 nm assigned to ZnO, also emission lines from Tb3+ at 484 nm (D-5(4) -> F-7(6)), 543 nm (D-5(4) -> F-7(6)), and 589 nm (D-5(4) -> F-7(4)), or from Tm3+ at 478 nm ((1)G(4) -> H-3(6)), and 511 mn (D-1(2) -> H-3(5)) were detected. Intensity of emission as function of applied voltage and current-voltage characteristic are shown and discussed. (c) 2005 Elsevier B.V. All rights reserved. | en |
dc.description.affiliation | UNESP, Inst Quim, BR-14801970 Araraquara, SP, Brazil | |
dc.description.affiliation | PUC Rio, Dept Fis, BR-22453900 Rio de Janeiro, Brazil | |
dc.description.affiliationUnesp | UNESP, Inst Quim, BR-14801970 Araraquara, SP, Brazil | |
dc.format.extent | 35-38 | |
dc.identifier | http://dx.doi.org/10.1016/j.jallcom.2005.10.066 | |
dc.identifier.citation | Journal of Alloys and Compounds. Lausanne: Elsevier B.V. Sa, v. 418, n. 1-2, p. 35-38, 2006. | |
dc.identifier.doi | 10.1016/j.jallcom.2005.10.066 | |
dc.identifier.issn | 0925-8388 | |
dc.identifier.lattes | 4284809342546287 | |
dc.identifier.uri | http://hdl.handle.net/11449/39670 | |
dc.identifier.wos | WOS:000238781500006 | |
dc.language.iso | eng | |
dc.publisher | Elsevier B.V. | |
dc.relation.ispartof | Journal of Alloys and Compounds | |
dc.relation.ispartofjcr | 3.779 | |
dc.relation.ispartofsjr | 1,020 | |
dc.rights.accessRights | Acesso restrito | |
dc.source | Web of Science | |
dc.subject | thin films | pt |
dc.subject | semiconductors | pt |
dc.subject | chemical synthesis | pt |
dc.subject | electronical transport | pt |
dc.subject | luminescence | pt |
dc.title | Low voltage electroluminescence of terbium- and thulium-doped zinc oxide films | en |
dc.type | Artigo | |
dcterms.license | http://www.elsevier.com/about/open-access/open-access-policies/article-posting-policy | |
dcterms.rightsHolder | Elsevier B.V. | |
dspace.entity.type | Publication | |
unesp.author.lattes | 4284809342546287 | |
unesp.author.orcid | 0000-0001-8326-1465[2] | |
unesp.campus | Universidade Estadual Paulista (UNESP), Instituto de Química, Araraquara | pt |
unesp.department | Química Inorgânica - IQAR | pt |
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