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Low pressure UV/H2O2 treatment for the degradation of pharmaceutical compounds acetaminophen, atenolol, bezafibrate, diclofenac and ibuprofen

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dc.contributor.authorParizi, Marcela [UNESP]
dc.contributor.authorKatsumata, Caroline
dc.contributor.authorTeixeira, Antonio Carlos
dc.contributor.authorAcosta, Arlen
dc.contributor.institutionUniversidade Estadual Paulista (Unesp)
dc.contributor.institutionUniversidade de São Paulo (USP)
dc.date.accessioned2019-10-03T18:19:23Z
dc.date.available2019-10-03T18:19:23Z
dc.date.issued2018-08-19
dc.description.affiliationUNESP, Energy Engn, Pres Prudente, SP, Brazil
dc.description.affiliationUniv Sao Paulo, Chem Engn Dept, Sao Paulo, SP, Brazil
dc.description.affiliationUnespUNESP, Energy Engn, Pres Prudente, SP, Brazil
dc.format.extent1
dc.identifier.citationAbstracts Of Papers Of The American Chemical Society. Washington: Amer Chemical Soc, v. 256, 1 p., 2018.
dc.identifier.issn0065-7727
dc.identifier.urihttp://hdl.handle.net/11449/184030
dc.identifier.wosWOS:000447609100553
dc.language.isoeng
dc.publisherAmer Chemical Soc
dc.relation.ispartofAbstracts Of Papers Of The American Chemical Society
dc.rights.accessRightsAcesso restritopt
dc.sourceWeb of Science
dc.titleLow pressure UV/H2O2 treatment for the degradation of pharmaceutical compounds acetaminophen, atenolol, bezafibrate, diclofenac and ibuprofenen
dc.typeResumopt
dcterms.rightsHolderAmer Chemical Soc
dspace.entity.typePublication
unesp.campusUniversidade Estadual Paulista (UNESP), Faculdade de Ciências e Tecnologia, Presidente Prudentept

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