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Very large dielectric constant of highly oriented Pb1-xBaxTiO3 thin films prepared by chemical deposition

dc.contributor.authorPontes, F. M.
dc.contributor.authorLeite, E. R.
dc.contributor.authorMambrini, G. P.
dc.contributor.authorEscote, M. T.
dc.contributor.authorLongo, Elson [UNESP]
dc.contributor.authorVarela, José Arana [UNESP]
dc.contributor.institutionUniversidade Federal de São Carlos (UFSCar)
dc.contributor.institutionUniversidade Estadual Paulista (Unesp)
dc.date.accessioned2014-05-20T15:29:41Z
dc.date.available2014-05-20T15:29:41Z
dc.date.issued2004-01-12
dc.description.abstractHighly (100) oriented Pb0.8Ba0.2TiO3/LaNiO3 structures were grown on LaAlO3(100) substrates by using a wet, soft chemical method and crystallized by the microwave oven technique. The Au/PBT/LaNiO3/LaAlO3 capacitor shows a hysteresis loop with remnant polarization, P-r, of 15 muC/cm(2), and coercive field, E-c, of 47 kV/cm at an applied voltage of 3 V, along with a dielectric constant over 1800. Atomic force microscopy showed that Pb0.8Ba0.2TiO3 is composed of large grains about 300 nm. The experimental results demonstrated that the microwave preparation is rapid, clean, and energy efficient. Therefore, we demonstrated that the combination of the soft chemical method with the microwave process is a promising technique to grow highly oriented thin films with excellent dielectric and ferroelectric properties, which can be used in various integrated device applications. (C) 2004 American Institute of Physics.en
dc.description.affiliationUFSCar, Dept Chem, LIEC, CMDMC, BR-13565905 Sao Carlos, SP, Brazil
dc.description.affiliationUNESP, Inst Chem, Araraquara, SP, Brazil
dc.description.affiliationUnespUNESP, Inst Chem, Araraquara, SP, Brazil
dc.format.extent248-250
dc.identifierhttp://dx.doi.org/10.1063/1.1637150
dc.identifier.citationApplied Physics Letters. Melville: Amer Inst Physics, v. 84, n. 2, p. 248-250, 2004.
dc.identifier.doi10.1063/1.1637150
dc.identifier.fileWOS000187916300030.pdf
dc.identifier.issn0003-6951
dc.identifier.urihttp://hdl.handle.net/11449/39209
dc.identifier.wosWOS:000187916300030
dc.language.isoeng
dc.publisherAmerican Institute of Physics (AIP)
dc.relation.ispartofApplied Physics Letters
dc.relation.ispartofjcr3.495
dc.relation.ispartofsjr1,382
dc.rights.accessRightsAcesso aberto
dc.sourceWeb of Science
dc.titleVery large dielectric constant of highly oriented Pb1-xBaxTiO3 thin films prepared by chemical depositionen
dc.typeArtigo
dcterms.licensehttp://publishing.aip.org/authors/web-posting-guidelines
dcterms.rightsHolderAmer Inst Physics
dspace.entity.typePublication
unesp.campusUniversidade Estadual Paulista (UNESP), Instituto de Química, Araraquarapt
unesp.departmentBioquímica e Tecnologia - IQARpt
unesp.departmentFísico-Química - IQARpt

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