Publicação: Very large dielectric constant of highly oriented Pb1-xBaxTiO3 thin films prepared by chemical deposition
dc.contributor.author | Pontes, F. M. | |
dc.contributor.author | Leite, E. R. | |
dc.contributor.author | Mambrini, G. P. | |
dc.contributor.author | Escote, M. T. | |
dc.contributor.author | Longo, Elson [UNESP] | |
dc.contributor.author | Varela, José Arana [UNESP] | |
dc.contributor.institution | Universidade Federal de São Carlos (UFSCar) | |
dc.contributor.institution | Universidade Estadual Paulista (Unesp) | |
dc.date.accessioned | 2014-05-20T15:29:41Z | |
dc.date.available | 2014-05-20T15:29:41Z | |
dc.date.issued | 2004-01-12 | |
dc.description.abstract | Highly (100) oriented Pb0.8Ba0.2TiO3/LaNiO3 structures were grown on LaAlO3(100) substrates by using a wet, soft chemical method and crystallized by the microwave oven technique. The Au/PBT/LaNiO3/LaAlO3 capacitor shows a hysteresis loop with remnant polarization, P-r, of 15 muC/cm(2), and coercive field, E-c, of 47 kV/cm at an applied voltage of 3 V, along with a dielectric constant over 1800. Atomic force microscopy showed that Pb0.8Ba0.2TiO3 is composed of large grains about 300 nm. The experimental results demonstrated that the microwave preparation is rapid, clean, and energy efficient. Therefore, we demonstrated that the combination of the soft chemical method with the microwave process is a promising technique to grow highly oriented thin films with excellent dielectric and ferroelectric properties, which can be used in various integrated device applications. (C) 2004 American Institute of Physics. | en |
dc.description.affiliation | UFSCar, Dept Chem, LIEC, CMDMC, BR-13565905 Sao Carlos, SP, Brazil | |
dc.description.affiliation | UNESP, Inst Chem, Araraquara, SP, Brazil | |
dc.description.affiliationUnesp | UNESP, Inst Chem, Araraquara, SP, Brazil | |
dc.format.extent | 248-250 | |
dc.identifier | http://dx.doi.org/10.1063/1.1637150 | |
dc.identifier.citation | Applied Physics Letters. Melville: Amer Inst Physics, v. 84, n. 2, p. 248-250, 2004. | |
dc.identifier.doi | 10.1063/1.1637150 | |
dc.identifier.file | WOS000187916300030.pdf | |
dc.identifier.issn | 0003-6951 | |
dc.identifier.uri | http://hdl.handle.net/11449/39209 | |
dc.identifier.wos | WOS:000187916300030 | |
dc.language.iso | eng | |
dc.publisher | American Institute of Physics (AIP) | |
dc.relation.ispartof | Applied Physics Letters | |
dc.relation.ispartofjcr | 3.495 | |
dc.relation.ispartofsjr | 1,382 | |
dc.rights.accessRights | Acesso aberto | |
dc.source | Web of Science | |
dc.title | Very large dielectric constant of highly oriented Pb1-xBaxTiO3 thin films prepared by chemical deposition | en |
dc.type | Artigo | |
dcterms.license | http://publishing.aip.org/authors/web-posting-guidelines | |
dcterms.rightsHolder | Amer Inst Physics | |
dspace.entity.type | Publication | |
unesp.campus | Universidade Estadual Paulista (UNESP), Instituto de Química, Araraquara | pt |
unesp.department | Bioquímica e Tecnologia - IQAR | pt |
unesp.department | Físico-Química - IQAR | pt |
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