Publicação: Treatment of Reticulated Vitreous Carbon by Dielectric Barrier Discharge Plasma for Electrodes Production
dc.contributor.author | Goncalves Da Silva, Leide Lili | |
dc.contributor.author | Ferreira, Luiz Gustavo | |
dc.contributor.author | Santos, Alberto Lima [UNESP] | |
dc.contributor.author | Botelho, Edson Cocchieri [UNESP] | |
dc.contributor.author | Toth, Andras | |
dc.contributor.author | Kostov, Konstantin G. [UNESP] | |
dc.contributor.institution | Faculdade de Tecnologia do Estado de São Paulo (FATEC) | |
dc.contributor.institution | Sch Lorena | |
dc.contributor.institution | Universidade Estadual Paulista (Unesp) | |
dc.contributor.institution | Hungarian Acad Sci | |
dc.date.accessioned | 2014-12-03T13:11:49Z | |
dc.date.available | 2014-12-03T13:11:49Z | |
dc.date.issued | 2013-12-01 | |
dc.description.abstract | This paper deals with the surface modification of reticulated vitreous carbon (RVC) by dielectric barrier discharge (DBD) for electrodes production. RVC samples were exposed to air-DBD plasma for 5.0 and 10.0 min. Following the treatment, the specimens were characterized by scanning electron microscopy (SEM), Raman spectroscopy, X-ray photoelectron spectroscopy (XPS), contact angle measurements, and electrochemical analyses [cyclic voltammetry (CV)]. The SEM images show an alteration of the RVC surface morphology because of the surface etching during the DBD processing. This finding is in agreement with the enhanced specific electrochemical surface area of RVC electrodes, which is related to an increase of its surface roughness. In addition, a slight increase of the oxygen content on the surface was confirmed by XPS analysis. Therefore, the RVC surface became more hydrophilic as detected by water contact angle measurements. For corroborating this statement, a solid monolithic vitreous carbon was used for this test. An increase in the anodic charge of the RVC electrodes due to the surface oxidation was also observed. Raman spectra showed insignificant changes in the material crystalline structure. | en |
dc.description.affiliation | FATEC, BR-12445010 Pindamonhangaba, Brazil | |
dc.description.affiliation | Sch Lorena, Dept Mat Engn, BR-76655 Lorena, Brazil | |
dc.description.affiliation | Sao Paulo State Univ UNESP, Dept Mat & Technol, BR-12516410 Guaratingueta, Brazil | |
dc.description.affiliation | Hungarian Acad Sci, Chem Res Ctr, Inst Mat & Environm Chem, H-1025 Budapest, Hungary | |
dc.description.affiliation | Sao Paulo State Univ UNESP, Dept Chem & Phys, BR-12516410 Guaratingueta, Brazil | |
dc.description.affiliationUnesp | Sao Paulo State Univ UNESP, Dept Mat & Technol, BR-12516410 Guaratingueta, Brazil | |
dc.description.affiliationUnesp | Sao Paulo State Univ UNESP, Dept Chem & Phys, BR-12516410 Guaratingueta, Brazil | |
dc.description.sponsorship | Fundação de Amparo à Pesquisa do Estado de São Paulo (FAPESP) | |
dc.description.sponsorshipId | FAPESP: 07/03714-3 | |
dc.description.sponsorshipId | FAPESP: 10/03148-0 | |
dc.format.extent | 3207-3213 | |
dc.identifier | http://dx.doi.org/10.1109/TPS.2013.2278239 | |
dc.identifier.citation | Ieee Transactions On Plasma Science. Piscataway: Ieee-inst Electrical Electronics Engineers Inc, v. 41, n. 12, p. 3207-3213, 2013. | |
dc.identifier.doi | 10.1109/TPS.2013.2278239 | |
dc.identifier.issn | 0093-3813 | |
dc.identifier.lattes | 4378078337343660 | |
dc.identifier.orcid | 0000-0001-8338-4879 | |
dc.identifier.uri | http://hdl.handle.net/11449/113599 | |
dc.identifier.wos | WOS:000328701100004 | |
dc.language.iso | eng | |
dc.publisher | Institute of Electrical and Electronics Engineers (IEEE) | |
dc.relation.ispartof | IEEE Transactions on Plasma Science | |
dc.relation.ispartofjcr | 1.253 | |
dc.relation.ispartofsjr | 0,522 | |
dc.rights.accessRights | Acesso restrito | |
dc.source | Web of Science | |
dc.subject | Atmospheric plasma treatment | en |
dc.subject | dielectric barrier discharge (DBD) | en |
dc.subject | electrodes | en |
dc.subject | reticulated vitreous carbon (RVC) | en |
dc.title | Treatment of Reticulated Vitreous Carbon by Dielectric Barrier Discharge Plasma for Electrodes Production | en |
dc.type | Artigo | |
dcterms.license | http://www.ieee.org/publications_standards/publications/rights/rights_policies.html | |
dcterms.rightsHolder | Ieee-inst Electrical Electronics Engineers Inc | |
dspace.entity.type | Publication | |
unesp.author.lattes | 4378078337343660[4] | |
unesp.author.orcid | 0000-0001-8338-4879[4] | |
unesp.campus | Universidade Estadual Paulista (UNESP), Faculdade de Engenharia, Guaratinguetá | pt |
unesp.department | Física e Química - FEG | pt |
unesp.department | Materiais e Tecnologia - FEG | pt |