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Comparative degradation of ZnO- and SnO(2)-based polycrystalline non-ohmic devices by current pulse stress

dc.contributor.authorRamirez, M. A. [UNESP]
dc.contributor.authorBassi, W.
dc.contributor.authorBueno, Paulo Roberto [UNESP]
dc.contributor.authorLongo, Elson [UNESP]
dc.contributor.authorVarela, José Arana [UNESP]
dc.contributor.institutionUniversidade Estadual Paulista (Unesp)
dc.contributor.institutionUniversidade de São Paulo (USP)
dc.date.accessioned2014-05-20T13:28:13Z
dc.date.available2014-05-20T13:28:13Z
dc.date.issued2008-06-21
dc.description.abstractThe degradation behaviour of SnO(2)-based varistors (SCNCr) due to current pulses (8/20 mu s) is reported here for the first time in comparison with the ZnO-based commercial varistors (ZnO). Puncturing and/or cracking failures were observed in ZnO-based varistors possessing inferior thermo-mechanical properties in comparison with that found in a SCNCr system free of failures. Both systems presented electric degradation related to the increase in the leakage current and decrease in the electric breakdown field, non-linear coefficient and average value of the potential barrier height. However, it was found that a more severe degradation occurred in the ZnO-based varistors concerning their non-ohmic behaviour, while in the SCNCr system, a strong non-ohmic behaviour remained after the degradation. These results indicate that the degradation in the metal oxide varistors is controlled by a defect diffusion process whose rate depends on the mobility, the concentration of meta-stable defects and the amount of electrically active interfaces. The improved behaviour of the SCNCr system is then inferred to be associated with the higher amount of electrically active interfaces (85%) and to a higher energy necessary to activate the diffusion of the specific defects.en
dc.description.affiliationUNESP, Univ Estadual Paulista, Inst Quim, BR-14800900 Araraquara, SP, Brazil
dc.description.affiliationUniv São Paulo, Inst Eletrotecn & Energia, BR-05508010 São Paulo, Brazil
dc.description.affiliationUnespUNESP, Univ Estadual Paulista, Inst Quim, BR-14800900 Araraquara, SP, Brazil
dc.format.extent5
dc.identifierhttp://dx.doi.org/10.1088/0022-3727/41/12/122002
dc.identifier.citationJournal of Physics D-applied Physics. Bristol: Iop Publishing Ltd, v. 41, n. 12, p. 5, 2008.
dc.identifier.doi10.1088/0022-3727/41/12/122002
dc.identifier.issn0022-3727
dc.identifier.lattes0477045906733254
dc.identifier.orcid0000-0003-2827-0208
dc.identifier.urihttp://hdl.handle.net/11449/9367
dc.identifier.wosWOS:000256568000002
dc.language.isoeng
dc.publisherIop Publishing Ltd
dc.relation.ispartofJournal of Physics D: Applied Physics
dc.relation.ispartofjcr2.373
dc.relation.ispartofsjr0,717
dc.rights.accessRightsAcesso restrito
dc.sourceWeb of Science
dc.titleComparative degradation of ZnO- and SnO(2)-based polycrystalline non-ohmic devices by current pulse stressen
dc.typeArtigo
dcterms.licensehttp://iopscience.iop.org/page/copyright
dcterms.rightsHolderIop Publishing Ltd
dspace.entity.typePublication
unesp.author.lattes0477045906733254[3]
unesp.author.orcid0000-0003-2827-0208[3]
unesp.campusUniversidade Estadual Paulista (UNESP), Instituto de Química, Araraquarapt
unesp.departmentBioquímica e Tecnologia - IQARpt
unesp.departmentFísico-Química - IQARpt

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